HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA REACTOR HEATED ELECTROSTATIC CHUCK

An AC(Alternating Current)-RF(Radio Frequency) decoupling filter of high AC current and RF power for a plasma reactor heating electrostatic chuck is provided to reduce the change of plasma or chamber impedance due to a heating circuit. A pair of RF filters(42,46) shows reactance a resistant heating...

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Hauptverfasser: PATERSON ALEXANDER M, SAMMONS JAMES E. III, WILLWERTH MICHAEL D, TODOROV VALENTIN N, HOLLAND JOHN P, HATCHER BRIAN K
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creator PATERSON ALEXANDER M
SAMMONS JAMES E. III
WILLWERTH MICHAEL D
TODOROV VALENTIN N
HOLLAND JOHN P
HATCHER BRIAN K
description An AC(Alternating Current)-RF(Radio Frequency) decoupling filter of high AC current and RF power for a plasma reactor heating electrostatic chuck is provided to reduce the change of plasma or chamber impedance due to a heating circuit. A pair of RF filters(42,46) shows reactance a resistant heating elements(30,32) and at least insulate two-phase AC(Alternating Current) frequency power suppliers(40,44) from 2kV p-p of HF(High Frequency) frequency power. The RF filter includes a pair of cylindrical non-conductive envelopes, a plurality of fused iron powdered toroids, a pair of wire conductors, and a pair of capacitors(64,66). The plurality of fused iron powdered toroids, whose external diameters are the approximately same as the internal diameter of each envelope, are coaxially stacked inside each of the pair of cylindrical envelopes, and has the magnetic permeability of 10. The pair of capacitors, which are connected between an input end of the pair of conductors and the ground, have one inductance which corresponds to inductors in a resonance frequency of more than 1 MHz greater than an HF frequency, and capacitance which forms resonance, wherein the RF filter shows inductive reactance in the HF frequency, and has RF damping greater than 60 dB in an RF frequency.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20070118959A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20070118959A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20070118959A3</originalsourceid><addsrcrecordid>eNqNjMEKwjAQRHvxIOo_LHgutIpoj0u6aUJjU7ZbPJZS4km0UP8fg_gBnmbezDDrZDK2MoAKVM9MjcCXWUPrb8SxSKMvSfm-dbapQFsnMdeeoXXYXRGYUElEQyhUAjlSwr4TFBtfTa_qbbK6j48l7H66SfaaRJk0zK8hLPM4hWd4DzUfsuyc5fmlOBV4_G_1AY3rNKM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA REACTOR HEATED ELECTROSTATIC CHUCK</title><source>esp@cenet</source><creator>PATERSON ALEXANDER M ; SAMMONS JAMES E. III ; WILLWERTH MICHAEL D ; TODOROV VALENTIN N ; HOLLAND JOHN P ; HATCHER BRIAN K</creator><creatorcontrib>PATERSON ALEXANDER M ; SAMMONS JAMES E. III ; WILLWERTH MICHAEL D ; TODOROV VALENTIN N ; HOLLAND JOHN P ; HATCHER BRIAN K</creatorcontrib><description>An AC(Alternating Current)-RF(Radio Frequency) decoupling filter of high AC current and RF power for a plasma reactor heating electrostatic chuck is provided to reduce the change of plasma or chamber impedance due to a heating circuit. A pair of RF filters(42,46) shows reactance a resistant heating elements(30,32) and at least insulate two-phase AC(Alternating Current) frequency power suppliers(40,44) from 2kV p-p of HF(High Frequency) frequency power. The RF filter includes a pair of cylindrical non-conductive envelopes, a plurality of fused iron powdered toroids, a pair of wire conductors, and a pair of capacitors(64,66). The plurality of fused iron powdered toroids, whose external diameters are the approximately same as the internal diameter of each envelope, are coaxially stacked inside each of the pair of cylindrical envelopes, and has the magnetic permeability of 10. The pair of capacitors, which are connected between an input end of the pair of conductors and the ground, have one inductance which corresponds to inductors in a resonance frequency of more than 1 MHz greater than an HF frequency, and capacitance which forms resonance, wherein the RF filter shows inductive reactance in the HF frequency, and has RF damping greater than 60 dB in an RF frequency.</description><language>eng</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20071218&amp;DB=EPODOC&amp;CC=KR&amp;NR=20070118959A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20071218&amp;DB=EPODOC&amp;CC=KR&amp;NR=20070118959A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PATERSON ALEXANDER M</creatorcontrib><creatorcontrib>SAMMONS JAMES E. III</creatorcontrib><creatorcontrib>WILLWERTH MICHAEL D</creatorcontrib><creatorcontrib>TODOROV VALENTIN N</creatorcontrib><creatorcontrib>HOLLAND JOHN P</creatorcontrib><creatorcontrib>HATCHER BRIAN K</creatorcontrib><title>HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA REACTOR HEATED ELECTROSTATIC CHUCK</title><description>An AC(Alternating Current)-RF(Radio Frequency) decoupling filter of high AC current and RF power for a plasma reactor heating electrostatic chuck is provided to reduce the change of plasma or chamber impedance due to a heating circuit. A pair of RF filters(42,46) shows reactance a resistant heating elements(30,32) and at least insulate two-phase AC(Alternating Current) frequency power suppliers(40,44) from 2kV p-p of HF(High Frequency) frequency power. The RF filter includes a pair of cylindrical non-conductive envelopes, a plurality of fused iron powdered toroids, a pair of wire conductors, and a pair of capacitors(64,66). The plurality of fused iron powdered toroids, whose external diameters are the approximately same as the internal diameter of each envelope, are coaxially stacked inside each of the pair of cylindrical envelopes, and has the magnetic permeability of 10. The pair of capacitors, which are connected between an input end of the pair of conductors and the ground, have one inductance which corresponds to inductors in a resonance frequency of more than 1 MHz greater than an HF frequency, and capacitance which forms resonance, wherein the RF filter shows inductive reactance in the HF frequency, and has RF damping greater than 60 dB in an RF frequency.</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjMEKwjAQRHvxIOo_LHgutIpoj0u6aUJjU7ZbPJZS4km0UP8fg_gBnmbezDDrZDK2MoAKVM9MjcCXWUPrb8SxSKMvSfm-dbapQFsnMdeeoXXYXRGYUElEQyhUAjlSwr4TFBtfTa_qbbK6j48l7H66SfaaRJk0zK8hLPM4hWd4DzUfsuyc5fmlOBV4_G_1AY3rNKM</recordid><startdate>20071218</startdate><enddate>20071218</enddate><creator>PATERSON ALEXANDER M</creator><creator>SAMMONS JAMES E. III</creator><creator>WILLWERTH MICHAEL D</creator><creator>TODOROV VALENTIN N</creator><creator>HOLLAND JOHN P</creator><creator>HATCHER BRIAN K</creator><scope>EVB</scope></search><sort><creationdate>20071218</creationdate><title>HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA REACTOR HEATED ELECTROSTATIC CHUCK</title><author>PATERSON ALEXANDER M ; SAMMONS JAMES E. III ; WILLWERTH MICHAEL D ; TODOROV VALENTIN N ; HOLLAND JOHN P ; HATCHER BRIAN K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20070118959A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>PATERSON ALEXANDER M</creatorcontrib><creatorcontrib>SAMMONS JAMES E. III</creatorcontrib><creatorcontrib>WILLWERTH MICHAEL D</creatorcontrib><creatorcontrib>TODOROV VALENTIN N</creatorcontrib><creatorcontrib>HOLLAND JOHN P</creatorcontrib><creatorcontrib>HATCHER BRIAN K</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PATERSON ALEXANDER M</au><au>SAMMONS JAMES E. III</au><au>WILLWERTH MICHAEL D</au><au>TODOROV VALENTIN N</au><au>HOLLAND JOHN P</au><au>HATCHER BRIAN K</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA REACTOR HEATED ELECTROSTATIC CHUCK</title><date>2007-12-18</date><risdate>2007</risdate><abstract>An AC(Alternating Current)-RF(Radio Frequency) decoupling filter of high AC current and RF power for a plasma reactor heating electrostatic chuck is provided to reduce the change of plasma or chamber impedance due to a heating circuit. A pair of RF filters(42,46) shows reactance a resistant heating elements(30,32) and at least insulate two-phase AC(Alternating Current) frequency power suppliers(40,44) from 2kV p-p of HF(High Frequency) frequency power. The RF filter includes a pair of cylindrical non-conductive envelopes, a plurality of fused iron powdered toroids, a pair of wire conductors, and a pair of capacitors(64,66). The plurality of fused iron powdered toroids, whose external diameters are the approximately same as the internal diameter of each envelope, are coaxially stacked inside each of the pair of cylindrical envelopes, and has the magnetic permeability of 10. The pair of capacitors, which are connected between an input end of the pair of conductors and the ground, have one inductance which corresponds to inductors in a resonance frequency of more than 1 MHz greater than an HF frequency, and capacitance which forms resonance, wherein the RF filter shows inductive reactance in the HF frequency, and has RF damping greater than 60 dB in an RF frequency.</abstract><oa>free_for_read</oa></addata></record>
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subjects ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
title HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA REACTOR HEATED ELECTROSTATIC CHUCK
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T08%3A11%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PATERSON%20ALEXANDER%20M&rft.date=2007-12-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20070118959A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true