METHOD OF PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

A semiconductor device and a fabricating method thereof are provided to improve the coverage of an oxidation-preventing film composed of P-SiN(SiON) covering a W film embedded in an alignment mark. A W film(2) embedded in a groove(10) of an alignment mark(1) is formed when a plug extending from a tr...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	IZUMI KAZUTOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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