PROCESS AND DEVICE FOR CLEANING AND ETCHING A SUBSTRATE WITH A TRANSPARENT CONDUCTIVE OXIDE LAYER

A simple process is disclosed for treating substrates having pre- structured zinc oxide layers on rigid or flexible supports. The ZnO is treated with an etching medium then with a cleaning liquid. The treatment with the etching and cleaning liquids is carried out while the substrate is conveyed thro...

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Hauptverfasser: RECH BERND, APENZELLER WOLFGANG, SCHOPE GUNNAR, SIEKMANN HILDEGARD, REPMANN TOBIAS, SEHRBROCK BRIGITTE, MULLER JOACHIM
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creator RECH BERND
APENZELLER WOLFGANG
SCHOPE GUNNAR
SIEKMANN HILDEGARD
REPMANN TOBIAS
SEHRBROCK BRIGITTE
MULLER JOACHIM
description A simple process is disclosed for treating substrates having pre- structured zinc oxide layers on rigid or flexible supports. The ZnO is treated with an etching medium then with a cleaning liquid. The treatment with the etching and cleaning liquids is carried out while the substrate is conveyed through a device. The process is technically simple to implement and makes it possible to regularly and homogeneously roughen and texturise ZnO layers of up to 1 m2. The device for treating substrates having pre-structured zinc oxide layers on rigid or flexible supports has for that purpose a first means for treating the substrate with an etching liquid, a second means for treating the substrate with a cleaning liquid, and another means, in particular transport rollers, for conveying the substrate from the first to the second means. ® KIPO & WIPO 2007
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title PROCESS AND DEVICE FOR CLEANING AND ETCHING A SUBSTRATE WITH A TRANSPARENT CONDUCTIVE OXIDE LAYER
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