VACUUM SYSTEM OF A APPARATUS OF MANUFACTURING A SEMICONDUCTOR SUBSTRATE AND MONITORING METHOD OF THE SAME

VACUUM SYSTEM OF A APPARATUS OF MANUFACTURING A SEMICONDUCTOR SUBSTRATE AND MONITORING METHOD OF THE SAME

A vacuum system of a semiconductor substrate processing apparatus and a monitoring method thereof are provided to prevent a pumped material from flowing reversely into a process chamber by blocking automatically an opening/closing valve in an abnormal vacuum pump state using a control unit. A vacuum...

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Bibliographische Detailangaben
Hauptverfasser: SON, JANG HO, KOO, BON OK, PARK, IN SUN, HA, JAE GYU, KIL, JUNG HWAN, KO, HYUN KUK
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Zusammenfassung:A vacuum system of a semiconductor substrate processing apparatus and a monitoring method thereof are provided to prevent a pumped material from flowing reversely into a process chamber by blocking automatically an opening/closing valve in an abnormal vacuum pump state using a control unit. A vacuum system of a semiconductor substrate processing apparatus includes a vacuum pump(120) for controlling the degree of vacuum in a process chamber, opening/closing valves(116,118,124) for opening/closing vacuum lines connected to the process chamber and the vacuum pump, a current detecting unit(130) for detecting a driving current capable of operating the vacuum pump, and a control unit. The control unit(140) controls the opening/closing valves in order to prevent the backflow in the vacuum lines.