CVD REACTOR COMPRISING PHOTODIODE ARRAY

The invention relates to a device for depositing especially crystalline layers on especially crystalline substrates, said device comprising a process chamber (1) which is arranged in a reactor housing and comprises a substrate holder (2) for receiving at least one substrate (8). A gas-admittance bod...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAEPPELER JOHANNES, SAYWELL VICTOR, MULLINS JOHN TREVOR
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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