METHOD FOR FORMING A POROUS REACTION INJECTION MOLDED CHEMICAL MECHANICAL POLISHING PAD

Formation of a chemical-mechanical polishing cushion comprises: providing a tank, a storage silo with micro-bead, an isocyanates storage tank with isocyanates; delivering the polymer materials and the micro-beads to a premix producing tank; forming the premix from polymer materials and the micro bea...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JAMES DAVID B, ROBERTS JOHN V.H
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GRINDING PERFORMING OPERATIONS POLISHING PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCESIN A PLASTIC STATE SEMICONDUCTOR DEVICES TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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