LITHOGRAPHY PROJECTION APPARATUS COMPRISING MEASUREMENT SYSTEM WHICH MEASURES PROJECTED SYSTEM TO REFERENCE FRAME AND HAS SENSORS, PREPARATION METHOD OF DEVICE, AND ANGLE ENCODER

PURPOSE: Provided are a lithography projection apparatus which has an improved structure to measure the position of a projection system, a method for preparing a device and an angle encoder which is used to measure the rotation of a projection system with a center of a light axis line. CONSTITUTION:...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RENKENS MICHAEL JOZEF MATHIJS, RUIJL THEO ANJES MARIA, LEENDERS MARTINUS HENDRIKUS ANTONIUS, VANDERPASCH ENGELBERTUS ANTONIUS FRANSISCUS, MEIJER HENDRICUS JOHANNES MARIA
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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