Method of forming semiconductor device with capacitor

PURPOSE: A method for fabricating a semiconductor device including a capacitor is provided to simplify the fabrication process without using an etch-stop layer by using a supporting layer and a sacrificial layer of different wet-etching speeds. CONSTITUTION: A supporting layer(116) and a sacrificial...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YOON, GWAN YEONG, OH, JAE HUI, KIM, HONG GI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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