Mehtod of Thin Film for Fabrication

Mehtod of Thin Film for Fabrication

PURPOSE: A method for fabricating a thin film is provided to form a thin film of desired thickness and desired composition ratio by irradiating a light source to a material for forming the thin film and detecting information of a sample deposited on a substrate therefrom. CONSTITUTION: One or more b...

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1. Verfasser: OH, HYEONG YUN
Format: Patent
Sprache:eng ; kor
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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description PURPOSE: A method for fabricating a thin film is provided to form a thin film of desired thickness and desired composition ratio by irradiating a light source to a material for forming the thin film and detecting information of a sample deposited on a substrate therefrom. CONSTITUTION: One or more boats and one or more samples are loaded into a vacuum chamber(S100). The loaded sample are heated and vaporized by applying electric power to a power cable of the boat in order to deposit the sample on a predetermined substrate(S200). The information of the sample deposited on the substrate by emitting the light to the vaporized sample is detected(S300). A thin film of desired thickness and a desired composition ratio is formed by controlling conditions of the sample deposited on the substrate(S400). 본 발명은 박막제조방법을 제공하기 위한 것으로서, 진공챔버내에 1가지 이상의 시료를 로딩하는 단계; 상기 시료들에 열을 가하여 승화 또는 기화시키는 단계; 상기 승화 또는 기화된 시료에 빛을 쪼여 상기 기판에 증착되는 시료의 정보를 검출하는 단계; 상기 정보에 의하여 상기 기판에 증착되는 시료의 조건을 제어하여 상기 기판에 박막을 형성하는 단계로 이루어지며, 박막을 형성하고자 하는 시료에 광원을 조사하여 스펙트럼의 세기로부터 시료의 정보를 얻어 시료의 조건을 제어하여 원하는 조성과 두께를 가진 박막층을 얻을 수 있다.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Mehtod of Thin Film for Fabrication
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