ETCHING APPARATUS AND ETCHING METHOD

PURPOSE: An etching apparatus is provided to keep a constant density of an etchant by using a stirring apparatus installed in an etching tank. CONSTITUTION: An etching apparatus comprises an etching tank(110) having openings in an upper and a lower portions, a first supply pipe(131) connected to the upper portion opening for supplying a dry gas, a second supply pipe(141) connected to the lower portion opening for supplying an etchant, a third supply pipe(142) connected to the second supply pipe(141) for supplying a cleaning solution, a first exhaust pipe(132) connected to the first supply pipe(131) for exhausting the etchant and the cleaning solution, a second exhaust pipe(143) connected to the second supply pipe(141) for exhausting the dry gas, a stirring apparatus(150) installed on the lower portion opening capable of circulating so as to mix and convect a mixed solution, a stirring apparatus driving part(160) for controlling the stirring apparatus(150).