NOVEL MONOMER FOR PHOTORESIST, COPOLYMER THEREOF AND PHOTORESIST COMPOSITION CONTAINING THE COPOLYMER

2,3-Dihydrobenzofuran derivatives represented by general formula (1), optically active isomers thereof, or pharmacologically acceptable salts of these, wherein R 1 represents hydrogen or acyl; R 2, R 3, and R 4 each represents hydrogen, lower alkyl, or lower alkenyl; and R 5 and R 6 each represents...

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Hauptverfasser:	NOH, CHI HYEONG, LEE, SEUNG HYEOK, CHO, CHAN SEOP
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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