METHOD FOR MANUFACTURING BIPOLAR DEVICE AND STRUCTURE THEREOF

PURPOSE: A method for manufacturing a bipolar device is provided to form a uniform thickness of a base thin film and to prevent impurity ratio and distribution of germanium from being non-uniform, by using a loading effect in manufacturing the base thin film including silicon and germanium. CONSTITU...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHO, DEOK HO, LEE, SU MIN, YUM, BYEONG RYEOL, HAN, TAE HYEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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