CONTRACTION FILM AND SHEET RESIN COMPOSITION FOR BLOCKING UV RAY
PURPOSE: A contraction film and sheet resin composition for blocking UV ray is provided, which is not modified optically, discolored, or aged when it is radiated by UV ray for a long time. CONSTITUTION: The resin composition comprises 0.05-0.8 wt% of benzotriazole-based UV absorbing agent represente...
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creator | KIM, YEONG HAN HAM, TAE WON AHN, YONG BAE |
description | PURPOSE: A contraction film and sheet resin composition for blocking UV ray is provided, which is not modified optically, discolored, or aged when it is radiated by UV ray for a long time. CONSTITUTION: The resin composition comprises 0.05-0.8 wt% of benzotriazole-based UV absorbing agent represented by the formula 1 as the first-state antioxidizing agent; 0.01-1.00 wt% of a hindered phenol-based UV stabilizing agent represented by the formula 2 as the second-state antioxidizing agent; optionally 0.01-2.0 wt% of an antistatic agent; and the balance of at least one resin selected from the group consisting of LDPE resin, HDPE resin, polypropylene resin, ethylene-propylene copolymer resin, ethylene-1-butene copolymer resin, ethylene-vinyl acetate resin and poly(vinyl chloride) resin. In the formula 1, X is H or halogen compound and R1 and R2 are a linear or branched alkyl group of C1-C8, and in the formula 2, R3 and R4 is a linear or branched alkyl group of C1-C8, and R5 is an ester group containing a linear or branched alkyl group of C10-C30. |
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CONSTITUTION: The resin composition comprises 0.05-0.8 wt% of benzotriazole-based UV absorbing agent represented by the formula 1 as the first-state antioxidizing agent; 0.01-1.00 wt% of a hindered phenol-based UV stabilizing agent represented by the formula 2 as the second-state antioxidizing agent; optionally 0.01-2.0 wt% of an antistatic agent; and the balance of at least one resin selected from the group consisting of LDPE resin, HDPE resin, polypropylene resin, ethylene-propylene copolymer resin, ethylene-1-butene copolymer resin, ethylene-vinyl acetate resin and poly(vinyl chloride) resin. In the formula 1, X is H or halogen compound and R1 and R2 are a linear or branched alkyl group of C1-C8, and in the formula 2, R3 and R4 is a linear or branched alkyl group of C1-C8, and R5 is an ester group containing a linear or branched alkyl group of C10-C30.</description><edition>7</edition><language>eng ; kor</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; GENERAL PROCESSES OF COMPOUNDING ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010615&DB=EPODOC&CC=KR&NR=20010047383A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010615&DB=EPODOC&CC=KR&NR=20010047383A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM, YEONG HAN</creatorcontrib><creatorcontrib>HAM, TAE WON</creatorcontrib><creatorcontrib>AHN, YONG BAE</creatorcontrib><title>CONTRACTION FILM AND SHEET RESIN COMPOSITION FOR BLOCKING UV RAY</title><description>PURPOSE: A contraction film and sheet resin composition for blocking UV ray is provided, which is not modified optically, discolored, or aged when it is radiated by UV ray for a long time. CONSTITUTION: The resin composition comprises 0.05-0.8 wt% of benzotriazole-based UV absorbing agent represented by the formula 1 as the first-state antioxidizing agent; 0.01-1.00 wt% of a hindered phenol-based UV stabilizing agent represented by the formula 2 as the second-state antioxidizing agent; optionally 0.01-2.0 wt% of an antistatic agent; and the balance of at least one resin selected from the group consisting of LDPE resin, HDPE resin, polypropylene resin, ethylene-propylene copolymer resin, ethylene-1-butene copolymer resin, ethylene-vinyl acetate resin and poly(vinyl chloride) resin. In the formula 1, X is H or halogen compound and R1 and R2 are a linear or branched alkyl group of C1-C8, and in the formula 2, R3 and R4 is a linear or branched alkyl group of C1-C8, and R5 is an ester group containing a linear or branched alkyl group of C10-C30.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBw9vcLCXJ0DvH091Nw8_TxVXD0c1EI9nB1DVEIcg329FNw9vcN8A_2hCjwD1Jw8vF39vb0c1cIDVMIcozkYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBgaGBgYm5sYWxo7GxKkCAFAKK28</recordid><startdate>20010615</startdate><enddate>20010615</enddate><creator>KIM, YEONG HAN</creator><creator>HAM, TAE WON</creator><creator>AHN, YONG BAE</creator><scope>EVB</scope></search><sort><creationdate>20010615</creationdate><title>CONTRACTION FILM AND SHEET RESIN COMPOSITION FOR BLOCKING UV RAY</title><author>KIM, YEONG HAN ; HAM, TAE WON ; AHN, YONG BAE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20010047383A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2001</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM, YEONG HAN</creatorcontrib><creatorcontrib>HAM, TAE WON</creatorcontrib><creatorcontrib>AHN, YONG BAE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM, YEONG HAN</au><au>HAM, TAE WON</au><au>AHN, YONG BAE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CONTRACTION FILM AND SHEET RESIN COMPOSITION FOR BLOCKING UV RAY</title><date>2001-06-15</date><risdate>2001</risdate><abstract>PURPOSE: A contraction film and sheet resin composition for blocking UV ray is provided, which is not modified optically, discolored, or aged when it is radiated by UV ray for a long time. CONSTITUTION: The resin composition comprises 0.05-0.8 wt% of benzotriazole-based UV absorbing agent represented by the formula 1 as the first-state antioxidizing agent; 0.01-1.00 wt% of a hindered phenol-based UV stabilizing agent represented by the formula 2 as the second-state antioxidizing agent; optionally 0.01-2.0 wt% of an antistatic agent; and the balance of at least one resin selected from the group consisting of LDPE resin, HDPE resin, polypropylene resin, ethylene-propylene copolymer resin, ethylene-1-butene copolymer resin, ethylene-vinyl acetate resin and poly(vinyl chloride) resin. In the formula 1, X is H or halogen compound and R1 and R2 are a linear or branched alkyl group of C1-C8, and in the formula 2, R3 and R4 is a linear or branched alkyl group of C1-C8, and R5 is an ester group containing a linear or branched alkyl group of C10-C30.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP |
title | CONTRACTION FILM AND SHEET RESIN COMPOSITION FOR BLOCKING UV RAY |
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