APPARATUS FOR SURFACE MODIFICATION OF POLYMER METAL AND CERAMIC MATERIALS USING ION BEAM
PURPOSE: An apparatus for surface modification of polymer, metal and ceramic materials using ion beam is provided, which is capable of controlling the amount of a reaction gas and the energy of an ion beam, modifying the surface of a powder material and implementing a continuous surface modification...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | CHOI, WON GUK CHO, JEONG JUNG, HYEONG JIN KO, SEOK GEUN |
| description | PURPOSE: An apparatus for surface modification of polymer, metal and ceramic materials using ion beam is provided, which is capable of controlling the amount of a reaction gas and the energy of an ion beam, modifying the surface of a powder material and implementing a continuous surface modification of a material. CONSTITUTION: In case irradiating an ion beam onto the surface of a metallic thin film, oxide thin film or organic material (200) having curved surfaces, an attraction force or repulsion force between the ions from the ion gun (210) and the surfaces of the material is generated by applying a voltage from a voltage source (220) to the material to be surface-modified simultaneously while Ar+ ions from the ion gun are accelerated, so that a charge distortion may be obtained to modify the composition and shapes of the surface of the material.
이온빔 (IB)을 이용한 고분자, 금속 및 세라믹 재료의 표면처리장치가 개시되어 있는데, 표면처리되는 재료에 인가되는 전압 (22)을 공급하고 제어함으로써 재료에 조사되는 이온빔 (IB) 에너지를 조절할 수 있고, 이온빔이 조사되는 진공조 영역에서의 반응성 가스 진공도를 이온빔이 발생되는 영역에서의 것과 다르게 하고, 또한 양면 조사 처리 및 연속 처리를 적용할 수 있다. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20010032692A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20010032692A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20010032692A3</originalsourceid><addsrcrecordid>eNqNyz0KAjEQQOE0FqLeYcBaiLsgWI7ZiQbzxyQBrZZFYiW6sN4fETyA1Wu-NxcXjBEZc0mgA0MqrFERuNAZbRRmEzwEDTHYqyMGRxktoO9AEaMzChxmYoM2QUnGH-E7HAjdUszuw2Oqq18XYq0pq9Omjq--TuNwq8_67s_cSLmVsm12-wbb_9QHltIxvg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>APPARATUS FOR SURFACE MODIFICATION OF POLYMER METAL AND CERAMIC MATERIALS USING ION BEAM</title><source>esp@cenet</source><creator>CHOI, WON GUK ; CHO, JEONG ; JUNG, HYEONG JIN ; KO, SEOK GEUN</creator><creatorcontrib>CHOI, WON GUK ; CHO, JEONG ; JUNG, HYEONG JIN ; KO, SEOK GEUN</creatorcontrib><description>PURPOSE: An apparatus for surface modification of polymer, metal and ceramic materials using ion beam is provided, which is capable of controlling the amount of a reaction gas and the energy of an ion beam, modifying the surface of a powder material and implementing a continuous surface modification of a material. CONSTITUTION: In case irradiating an ion beam onto the surface of a metallic thin film, oxide thin film or organic material (200) having curved surfaces, an attraction force or repulsion force between the ions from the ion gun (210) and the surfaces of the material is generated by applying a voltage from a voltage source (220) to the material to be surface-modified simultaneously while Ar+ ions from the ion gun are accelerated, so that a charge distortion may be obtained to modify the composition and shapes of the surface of the material.
이온빔 (IB)을 이용한 고분자, 금속 및 세라믹 재료의 표면처리장치가 개시되어 있는데, 표면처리되는 재료에 인가되는 전압 (22)을 공급하고 제어함으로써 재료에 조사되는 이온빔 (IB) 에너지를 조절할 수 있고, 이온빔이 조사되는 진공조 영역에서의 반응성 가스 진공도를 이온빔이 발생되는 영역에서의 것과 다르게 하고, 또한 양면 조사 처리 및 연속 처리를 적용할 수 있다.</description><edition>7</edition><language>eng ; kor</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOSITIONS BASED THEREON ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR ; GENERAL PROCESSES OF COMPOUNDING ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LAUNDERING ; METALLURGY ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; ORGANIC MACROMOLECULAR COMPOUNDS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TEXTILES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TREATING TEXTILE MATERIALS BY LIQUIDS, GASES OR VAPOURS ; TREATMENT OF TEXTILES OR THE LIKE ; WORKING-UP</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010425&DB=EPODOC&CC=KR&NR=20010032692A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010425&DB=EPODOC&CC=KR&NR=20010032692A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHOI, WON GUK</creatorcontrib><creatorcontrib>CHO, JEONG</creatorcontrib><creatorcontrib>JUNG, HYEONG JIN</creatorcontrib><creatorcontrib>KO, SEOK GEUN</creatorcontrib><title>APPARATUS FOR SURFACE MODIFICATION OF POLYMER METAL AND CERAMIC MATERIALS USING ION BEAM</title><description>PURPOSE: An apparatus for surface modification of polymer, metal and ceramic materials using ion beam is provided, which is capable of controlling the amount of a reaction gas and the energy of an ion beam, modifying the surface of a powder material and implementing a continuous surface modification of a material. CONSTITUTION: In case irradiating an ion beam onto the surface of a metallic thin film, oxide thin film or organic material (200) having curved surfaces, an attraction force or repulsion force between the ions from the ion gun (210) and the surfaces of the material is generated by applying a voltage from a voltage source (220) to the material to be surface-modified simultaneously while Ar+ ions from the ion gun are accelerated, so that a charge distortion may be obtained to modify the composition and shapes of the surface of the material.
이온빔 (IB)을 이용한 고분자, 금속 및 세라믹 재료의 표면처리장치가 개시되어 있는데, 표면처리되는 재료에 인가되는 전압 (22)을 공급하고 제어함으로써 재료에 조사되는 이온빔 (IB) 에너지를 조절할 수 있고, 이온빔이 조사되는 진공조 영역에서의 반응성 가스 진공도를 이온빔이 발생되는 영역에서의 것과 다르게 하고, 또한 양면 조사 처리 및 연속 처리를 적용할 수 있다.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LAUNDERING</subject><subject>METALLURGY</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TEXTILES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>TREATING TEXTILE MATERIALS BY LIQUIDS, GASES OR VAPOURS</subject><subject>TREATMENT OF TEXTILES OR THE LIKE</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyz0KAjEQQOE0FqLeYcBaiLsgWI7ZiQbzxyQBrZZFYiW6sN4fETyA1Wu-NxcXjBEZc0mgA0MqrFERuNAZbRRmEzwEDTHYqyMGRxktoO9AEaMzChxmYoM2QUnGH-E7HAjdUszuw2Oqq18XYq0pq9Omjq--TuNwq8_67s_cSLmVsm12-wbb_9QHltIxvg</recordid><startdate>20010425</startdate><enddate>20010425</enddate><creator>CHOI, WON GUK</creator><creator>CHO, JEONG</creator><creator>JUNG, HYEONG JIN</creator><creator>KO, SEOK GEUN</creator><scope>EVB</scope></search><sort><creationdate>20010425</creationdate><title>APPARATUS FOR SURFACE MODIFICATION OF POLYMER METAL AND CERAMIC MATERIALS USING ION BEAM</title><author>CHOI, WON GUK ; CHO, JEONG ; JUNG, HYEONG JIN ; KO, SEOK GEUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20010032692A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2001</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LAUNDERING</topic><topic>METALLURGY</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TEXTILES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>TREATING TEXTILE MATERIALS BY LIQUIDS, GASES OR VAPOURS</topic><topic>TREATMENT OF TEXTILES OR THE LIKE</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>CHOI, WON GUK</creatorcontrib><creatorcontrib>CHO, JEONG</creatorcontrib><creatorcontrib>JUNG, HYEONG JIN</creatorcontrib><creatorcontrib>KO, SEOK GEUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHOI, WON GUK</au><au>CHO, JEONG</au><au>JUNG, HYEONG JIN</au><au>KO, SEOK GEUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS FOR SURFACE MODIFICATION OF POLYMER METAL AND CERAMIC MATERIALS USING ION BEAM</title><date>2001-04-25</date><risdate>2001</risdate><abstract>PURPOSE: An apparatus for surface modification of polymer, metal and ceramic materials using ion beam is provided, which is capable of controlling the amount of a reaction gas and the energy of an ion beam, modifying the surface of a powder material and implementing a continuous surface modification of a material. CONSTITUTION: In case irradiating an ion beam onto the surface of a metallic thin film, oxide thin film or organic material (200) having curved surfaces, an attraction force or repulsion force between the ions from the ion gun (210) and the surfaces of the material is generated by applying a voltage from a voltage source (220) to the material to be surface-modified simultaneously while Ar+ ions from the ion gun are accelerated, so that a charge distortion may be obtained to modify the composition and shapes of the surface of the material.
이온빔 (IB)을 이용한 고분자, 금속 및 세라믹 재료의 표면처리장치가 개시되어 있는데, 표면처리되는 재료에 인가되는 전압 (22)을 공급하고 제어함으로써 재료에 조사되는 이온빔 (IB) 에너지를 조절할 수 있고, 이온빔이 조사되는 진공조 영역에서의 반응성 가스 진공도를 이온빔이 발생되는 영역에서의 것과 다르게 하고, 또한 양면 조사 처리 및 연속 처리를 적용할 수 있다.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; kor |
| recordid | cdi_epo_espacenet_KR20010032692A |
| source | esp@cenet |
| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS BASED THEREON DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR GENERAL PROCESSES OF COMPOUNDING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAUNDERING METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ORGANIC MACROMOLECULAR COMPOUNDS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TEXTILES THEIR PREPARATION OR CHEMICAL WORKING-UP TREATING TEXTILE MATERIALS BY LIQUIDS, GASES OR VAPOURS TREATMENT OF TEXTILES OR THE LIKE WORKING-UP |
| title | APPARATUS FOR SURFACE MODIFICATION OF POLYMER METAL AND CERAMIC MATERIALS USING ION BEAM |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T01%3A21%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CHOI,%20WON%20GUK&rft.date=2001-04-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20010032692A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |