DEVICE FOR INSPECTING FOREIGN MATTER AND FAULT

PURPOSE: A device is provided to quickly investigate the causes of abnormality by measuring information on size of the detected object at real time and controlling only the detected object of specific size using the information on size. CONSTITUTION: First, a light from an illumination source(201) i...

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Bibliographische Detailangaben
Hauptverfasser: WATANABE GENJI, NOGUCHI MINORU, NAKAMURA HISATO, NISHIYAMA HIDETOSHI, OSHIMA YOSHIMASA, WATANABE TETSUYA, JINGU TAKAHIRO, SAIKI GEIKI, INOUE HIROKO
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: A device is provided to quickly investigate the causes of abnormality by measuring information on size of the detected object at real time and controlling only the detected object of specific size using the information on size. CONSTITUTION: First, a light from an illumination source(201) is given to an object(202) to be inspected, a scattering light from the object(202) to be inspected is condensed by a condensing lens(203), and a reflection light from the object(202) to be inspected is detected by a detetcor(204). The reflection light detected by the detector(204) is subjected to photoelectric conversion, and it is processed by a signal processing circuit(205) to detect a foreign matter. Further, the object(202) to be inspected is moved by a stage(207), so that a foreign matter can be detected in the entire area of the object(202) and a detection result be also indicated in a data indication part(206). Thus, a status relating to the size and generation cause of the foreign matter having a specific size is controlled, thereby finding out the cause of generation of the foreign matter quickly in a manufacturing device.