EXPOSURE DEVICE

PURPOSE: To realize exposure whichever direction the placing direction of a substrate is and to improve the degree of freedom in the layout of a pattern exposed on the substrate by providing a substrate holding means set so that it can correspond with plural placing directions of the substrate. CONS...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	EKOSHI YUKIHISA
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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