VACUUM CHAMBER FOR METAL DEPOSITION

PURPOSE: A vacuum chamber for metal deposition is provided to prevent reduction of a life cycle of an ion gauge and deterioration of accuracy of vacuum indication, and decrease defects in the metal deposition process, thereby increasing a process reliability by simultaneously opening or closing a va...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BYUN, DAE IL, KIM, YEONG SEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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