1 2 PLASMA DEVICE
The plasma device of the present invention may include a chamber for accommodating a workpiece to be plasma-processed; a first antenna and a second antenna disposed on one side of the chamber and exciting plasma in the chamber by the application of high frequency power. The first antenna may be rota...
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| creator | SUH, KEE WON |
| description | The plasma device of the present invention may include a chamber for accommodating a workpiece to be plasma-processed; a first antenna and a second antenna disposed on one side of the chamber and exciting plasma in the chamber by the application of high frequency power. The first antenna may be rotated relative to the chamber. The second antenna may be rotatably coupled to the chamber with respect to the first antenna or the chamber. Plasma processing can be performed uniformly on the workpiece according to a processing environment.
본 발명의 플라즈마 장치는, 플라즈마 가공되는 가공물이 수용되는 챔버; 상기 챔버의 일측에 배치되고, 고주파 전력의 인가에 의해 상기 챔버 내에 플라즈마를 여기시키는 제1 안테나 및 제2 안테나; 를 포함할 수 있고, 상기 제1 안테나는 상기 챔버에 대해 회전될 수 있고, 상기 제2 안테나는 상기 제1 안테나 또는 상기 챔버에 대해 회전 가능하게 상기 챔버에 결합될 수 있다. |
| format | Patent |
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본 발명의 플라즈마 장치는, 플라즈마 가공되는 가공물이 수용되는 챔버; 상기 챔버의 일측에 배치되고, 고주파 전력의 인가에 의해 상기 챔버 내에 플라즈마를 여기시키는 제1 안테나 및 제2 안테나; 를 포함할 수 있고, 상기 제1 안테나는 상기 챔버에 대해 회전될 수 있고, 상기 제2 안테나는 상기 제1 안테나 또는 상기 챔버에 대해 회전 가능하게 상기 챔버에 결합될 수 있다.</description><language>eng ; kor</language><subject>ANTENNAS, i.e. RADIO AERIALS ; BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180320&DB=EPODOC&CC=KR&NR=101840295B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180320&DB=EPODOC&CC=KR&NR=101840295B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUH, KEE WON</creatorcontrib><title>1 2 PLASMA DEVICE</title><description>The plasma device of the present invention may include a chamber for accommodating a workpiece to be plasma-processed; a first antenna and a second antenna disposed on one side of the chamber and exciting plasma in the chamber by the application of high frequency power. The first antenna may be rotated relative to the chamber. The second antenna may be rotatably coupled to the chamber with respect to the first antenna or the chamber. Plasma processing can be performed uniformly on the workpiece according to a processing environment.
본 발명의 플라즈마 장치는, 플라즈마 가공되는 가공물이 수용되는 챔버; 상기 챔버의 일측에 배치되고, 고주파 전력의 인가에 의해 상기 챔버 내에 플라즈마를 여기시키는 제1 안테나 및 제2 안테나; 를 포함할 수 있고, 상기 제1 안테나는 상기 챔버에 대해 회전될 수 있고, 상기 제2 안테나는 상기 제1 안테나 또는 상기 챔버에 대해 회전 가능하게 상기 챔버에 결합될 수 있다.</description><subject>ANTENNAS, i.e. RADIO AERIALS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBA0VDBSCPBxDPZ1VHBxDfN0duVhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQYYGhhYmBkaWpk5OhsbEqQIAWJweKQ</recordid><startdate>20180320</startdate><enddate>20180320</enddate><creator>SUH, KEE WON</creator><scope>EVB</scope></search><sort><creationdate>20180320</creationdate><title>1 2 PLASMA DEVICE</title><author>SUH, KEE WON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR101840295BB13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2018</creationdate><topic>ANTENNAS, i.e. RADIO AERIALS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>SUH, KEE WON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUH, KEE WON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>1 2 PLASMA DEVICE</title><date>2018-03-20</date><risdate>2018</risdate><abstract>The plasma device of the present invention may include a chamber for accommodating a workpiece to be plasma-processed; a first antenna and a second antenna disposed on one side of the chamber and exciting plasma in the chamber by the application of high frequency power. The first antenna may be rotated relative to the chamber. The second antenna may be rotatably coupled to the chamber with respect to the first antenna or the chamber. Plasma processing can be performed uniformly on the workpiece according to a processing environment.
본 발명의 플라즈마 장치는, 플라즈마 가공되는 가공물이 수용되는 챔버; 상기 챔버의 일측에 배치되고, 고주파 전력의 인가에 의해 상기 챔버 내에 플라즈마를 여기시키는 제1 안테나 및 제2 안테나; 를 포함할 수 있고, 상기 제1 안테나는 상기 챔버에 대해 회전될 수 있고, 상기 제2 안테나는 상기 제1 안테나 또는 상기 챔버에 대해 회전 가능하게 상기 챔버에 결합될 수 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ANTENNAS, i.e. RADIO AERIALS BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY |
| title | 1 2 PLASMA DEVICE |
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