SCREEN FOR LINEAR SOURCE FOR PREVENTING SHADOW EFFECT

The purpose of the present invention is to install a blocking plate to prevent a shadow effect on a linear evaporation source having a long length and is to provide a method for removing a singular point generated in the thickness of a thin film due to the blocking plate. According to the present in...

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Hauptverfasser: KIM, SEONG MOON, PARK, EUN SIK, CHI, DAE JOON, LEE, KWANG MIN, HONG, YE WON, CHO, KYU JOONG
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PARK, EUN SIK
CHI, DAE JOON
LEE, KWANG MIN
HONG, YE WON
CHO, KYU JOONG
description The purpose of the present invention is to install a blocking plate to prevent a shadow effect on a linear evaporation source having a long length and is to provide a method for removing a singular point generated in the thickness of a thin film due to the blocking plate. According to the present invention, the blocking plate is installed in the center of a long linear evaporation source and the height of the blocking plate is not constant but gradually decreased or increased in an inclined manner. The blocking plate having a gradient in height is installed in the center of the linear evaporation source, and a thin film is deposited while scanning a substrate or the linear evaporation source, thereby eliminating the singular point generated in the thickness of the thin film. 본 발명의 목적은 길이가 긴 선형증발원에 대해 쉐도우 효과를 방지하기 위해 차단판을 설치하되, 차단판으로 인해 막 두께에 발생하는 특이점을 없앨 수 있는 방안을 제공하고자 하는 것이다. 본 발명은, 길이가 긴 선형증발원의 중심부에 차단판을 설치하되, 차단판의 형상을 달리하여 차단판의 높이가 일정하지 않고 점차 낮아지거나 높아지는 경사형으로 구성하였다. 이러한 경사선으로 된 높이를 갖는 차단판을 선형증발원의 중심부에 설치하고 기판 또는 선형증발원을 스캔하면서 박막을 증착하여 박막 두께에 생기는 특이점을 없앤다.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR101699168BB1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR101699168BB1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR101699168BB13</originalsourceid><addsrcrecordid>eNrjZDANdg5ydfVTcPMPUvDx9HN1DFII9g8NcnYFiwQEuYa5-oV4-rkrBHs4uviHK7i6ubk6h_AwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvIEMDQzNLS0MzCycnQ2PiVAEAg9IooQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SCREEN FOR LINEAR SOURCE FOR PREVENTING SHADOW EFFECT</title><source>esp@cenet</source><creator>KIM, SEONG MOON ; PARK, EUN SIK ; CHI, DAE JOON ; LEE, KWANG MIN ; HONG, YE WON ; CHO, KYU JOONG</creator><creatorcontrib>KIM, SEONG MOON ; PARK, EUN SIK ; CHI, DAE JOON ; LEE, KWANG MIN ; HONG, YE WON ; CHO, KYU JOONG</creatorcontrib><description>The purpose of the present invention is to install a blocking plate to prevent a shadow effect on a linear evaporation source having a long length and is to provide a method for removing a singular point generated in the thickness of a thin film due to the blocking plate. According to the present invention, the blocking plate is installed in the center of a long linear evaporation source and the height of the blocking plate is not constant but gradually decreased or increased in an inclined manner. The blocking plate having a gradient in height is installed in the center of the linear evaporation source, and a thin film is deposited while scanning a substrate or the linear evaporation source, thereby eliminating the singular point generated in the thickness of the thin film. 본 발명의 목적은 길이가 긴 선형증발원에 대해 쉐도우 효과를 방지하기 위해 차단판을 설치하되, 차단판으로 인해 막 두께에 발생하는 특이점을 없앨 수 있는 방안을 제공하고자 하는 것이다. 본 발명은, 길이가 긴 선형증발원의 중심부에 차단판을 설치하되, 차단판의 형상을 달리하여 차단판의 높이가 일정하지 않고 점차 낮아지거나 높아지는 경사형으로 구성하였다. 이러한 경사선으로 된 높이를 갖는 차단판을 선형증발원의 중심부에 설치하고 기판 또는 선형증발원을 스캔하면서 박막을 증착하여 박막 두께에 생기는 특이점을 없앤다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170131&amp;DB=EPODOC&amp;CC=KR&amp;NR=101699168B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170131&amp;DB=EPODOC&amp;CC=KR&amp;NR=101699168B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM, SEONG MOON</creatorcontrib><creatorcontrib>PARK, EUN SIK</creatorcontrib><creatorcontrib>CHI, DAE JOON</creatorcontrib><creatorcontrib>LEE, KWANG MIN</creatorcontrib><creatorcontrib>HONG, YE WON</creatorcontrib><creatorcontrib>CHO, KYU JOONG</creatorcontrib><title>SCREEN FOR LINEAR SOURCE FOR PREVENTING SHADOW EFFECT</title><description>The purpose of the present invention is to install a blocking plate to prevent a shadow effect on a linear evaporation source having a long length and is to provide a method for removing a singular point generated in the thickness of a thin film due to the blocking plate. According to the present invention, the blocking plate is installed in the center of a long linear evaporation source and the height of the blocking plate is not constant but gradually decreased or increased in an inclined manner. The blocking plate having a gradient in height is installed in the center of the linear evaporation source, and a thin film is deposited while scanning a substrate or the linear evaporation source, thereby eliminating the singular point generated in the thickness of the thin film. 본 발명의 목적은 길이가 긴 선형증발원에 대해 쉐도우 효과를 방지하기 위해 차단판을 설치하되, 차단판으로 인해 막 두께에 발생하는 특이점을 없앨 수 있는 방안을 제공하고자 하는 것이다. 본 발명은, 길이가 긴 선형증발원의 중심부에 차단판을 설치하되, 차단판의 형상을 달리하여 차단판의 높이가 일정하지 않고 점차 낮아지거나 높아지는 경사형으로 구성하였다. 이러한 경사선으로 된 높이를 갖는 차단판을 선형증발원의 중심부에 설치하고 기판 또는 선형증발원을 스캔하면서 박막을 증착하여 박막 두께에 생기는 특이점을 없앤다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDANdg5ydfVTcPMPUvDx9HN1DFII9g8NcnYFiwQEuYa5-oV4-rkrBHs4uviHK7i6ubk6h_AwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvIEMDQzNLS0MzCycnQ2PiVAEAg9IooQ</recordid><startdate>20170131</startdate><enddate>20170131</enddate><creator>KIM, SEONG MOON</creator><creator>PARK, EUN SIK</creator><creator>CHI, DAE JOON</creator><creator>LEE, KWANG MIN</creator><creator>HONG, YE WON</creator><creator>CHO, KYU JOONG</creator><scope>EVB</scope></search><sort><creationdate>20170131</creationdate><title>SCREEN FOR LINEAR SOURCE FOR PREVENTING SHADOW EFFECT</title><author>KIM, SEONG MOON ; PARK, EUN SIK ; CHI, DAE JOON ; LEE, KWANG MIN ; HONG, YE WON ; CHO, KYU JOONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR101699168BB13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM, SEONG MOON</creatorcontrib><creatorcontrib>PARK, EUN SIK</creatorcontrib><creatorcontrib>CHI, DAE JOON</creatorcontrib><creatorcontrib>LEE, KWANG MIN</creatorcontrib><creatorcontrib>HONG, YE WON</creatorcontrib><creatorcontrib>CHO, KYU JOONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM, SEONG MOON</au><au>PARK, EUN SIK</au><au>CHI, DAE JOON</au><au>LEE, KWANG MIN</au><au>HONG, YE WON</au><au>CHO, KYU JOONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SCREEN FOR LINEAR SOURCE FOR PREVENTING SHADOW EFFECT</title><date>2017-01-31</date><risdate>2017</risdate><abstract>The purpose of the present invention is to install a blocking plate to prevent a shadow effect on a linear evaporation source having a long length and is to provide a method for removing a singular point generated in the thickness of a thin film due to the blocking plate. According to the present invention, the blocking plate is installed in the center of a long linear evaporation source and the height of the blocking plate is not constant but gradually decreased or increased in an inclined manner. The blocking plate having a gradient in height is installed in the center of the linear evaporation source, and a thin film is deposited while scanning a substrate or the linear evaporation source, thereby eliminating the singular point generated in the thickness of the thin film. 본 발명의 목적은 길이가 긴 선형증발원에 대해 쉐도우 효과를 방지하기 위해 차단판을 설치하되, 차단판으로 인해 막 두께에 발생하는 특이점을 없앨 수 있는 방안을 제공하고자 하는 것이다. 본 발명은, 길이가 긴 선형증발원의 중심부에 차단판을 설치하되, 차단판의 형상을 달리하여 차단판의 높이가 일정하지 않고 점차 낮아지거나 높아지는 경사형으로 구성하였다. 이러한 경사선으로 된 높이를 갖는 차단판을 선형증발원의 중심부에 설치하고 기판 또는 선형증발원을 스캔하면서 박막을 증착하여 박막 두께에 생기는 특이점을 없앤다.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title SCREEN FOR LINEAR SOURCE FOR PREVENTING SHADOW EFFECT
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-14T12%3A36%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KIM,%20SEONG%20MOON&rft.date=2017-01-31&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR101699168BB1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true