CLEANING MECHANISM AND CLEANING METHODS

CLEANING MECHANISM AND CLEANING METHODS

According to the present invention, a cleaning device, capable of cleaning the inside of a container by being installed in the container, includes a spray nozzle, which is at least partially inserted into the container and sprays a cleaning base material to an inner wall of the container, and a clea...

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Hauptverfasser: NAM, KI CHUL, YOON, BONG HYUN
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator NAM, KI CHUL
YOON, BONG HYUN
description According to the present invention, a cleaning device, capable of cleaning the inside of a container by being installed in the container, includes a spray nozzle, which is at least partially inserted into the container and sprays a cleaning base material to an inner wall of the container, and a cleaning body which is placed closely to the spray nozzle and sucks a cleaning object dropped by the cleaning base material. Therefore, according to an embodiment of the present invention, the cleaning device efficiently cleans the inside of the container by being at least partially inserted into the substrate processing device to run a cleaning process. Moreover, since the cleaning device is inserted, a container of the substrate processing device is closed, and then the inside of the container is cleaned, harmful byproducts are not exposed to a worker during a maintenance work so that a safety problem can be prevented. And after the process of the substrate processing device, the harmful byproducts causing environmental problems are broken and dissociated and then sucked through a vacuum pump so that the byproducts are eco-friendly removed.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title CLEANING MECHANISM AND CLEANING METHODS
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