PHOTORESIST REDUCTION SYSTEM
The present invention relates to a photoresist reduction system. The photoresist reduction system according to one embodiment of the present invention includes a first container (1) which receives photoresist; a first buffer tank (2) which detects air bubbles included in the photoresist; a first pre...
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| creator | BAK, JAE HYEON JO, GYEONG MAN SIN, DONG HUN KIM, JEONG GI |
| description | The present invention relates to a photoresist reduction system. The photoresist reduction system according to one embodiment of the present invention includes a first container (1) which receives photoresist; a first buffer tank (2) which detects air bubbles included in the photoresist; a first pressing gas injection pipe (3); a first connection pipe (4); a second buffer tank (7); a second pressing gas injection pipe (8); a second connection pipe (9); a manifold (13); a discharge pipe (14) connected to the manifold (13); and a control part (18). According to one embodiment of the present invention, the control part (18) opens a second bent vale (10) and a third valve (17b). |
| format | Patent |
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The photoresist reduction system according to one embodiment of the present invention includes a first container (1) which receives photoresist; a first buffer tank (2) which detects air bubbles included in the photoresist; a first pressing gas injection pipe (3); a first connection pipe (4); a second buffer tank (7); a second pressing gas injection pipe (8); a second connection pipe (9); a manifold (13); a discharge pipe (14) connected to the manifold (13); and a control part (18). According to one embodiment of the present invention, the control part (18) opens a second bent vale (10) and a third valve (17b).</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140508&DB=EPODOC&CC=KR&NR=101392842B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140508&DB=EPODOC&CC=KR&NR=101392842B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BAK, JAE HYEON</creatorcontrib><creatorcontrib>JO, GYEONG MAN</creatorcontrib><creatorcontrib>SIN, DONG HUN</creatorcontrib><creatorcontrib>KIM, JEONG GI</creatorcontrib><title>PHOTORESIST REDUCTION SYSTEM</title><description>The present invention relates to a photoresist reduction system. 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The photoresist reduction system according to one embodiment of the present invention includes a first container (1) which receives photoresist; a first buffer tank (2) which detects air bubbles included in the photoresist; a first pressing gas injection pipe (3); a first connection pipe (4); a second buffer tank (7); a second pressing gas injection pipe (8); a second connection pipe (9); a manifold (13); a discharge pipe (14) connected to the manifold (13); and a control part (18). According to one embodiment of the present invention, the control part (18) opens a second bent vale (10) and a third valve (17b).</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | PHOTORESIST REDUCTION SYSTEM |
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