TREATMENT METHOD FOR WASTE ORGANIC SOLVENT CONTAINING PHOTORESIST COMPONENT

A method for treating a waste organic solvent generated in a display fabricating process by a process that is capable of easily separating photoresist components from the waste organic solvent without a process trouble and increasing the recovery ratio of an organic solvent in a subsequent organic solvent regenerating process is provided. In a method for treating a waste organic solvent using double or multiple drum-type evaporation dryers having a gas exhaust port, a waste organic solvent injection port and a solid discharge port respectively formed in an upper part, an intermediate part and a lower part thereof, and cylinder type double or multiple heating drums(1) installed therein and rotated at a predetermined rotary speed, and scrapers(2) formed on respective surfaces of the double or multiple heating drums, the method comprises the steps of: (a) injecting a waste organic solvent containing photoresist components into the waste organic solvent injection port; (b) forming a waste organic solvent oil film on the surfaces of the double or multiple heating drums to evaporate an organic solvent; (c) removing photoresist components remained on the surfaces of the double or multiple heating drums by using the scrapers, and discharging the photoresist components through the solid discharge port; and (d) condensing the organic solvent evaporated in the step(b) to recover the organic solvent.