SYSTEM FOR REFINING HIGHLY CONCENTRATED PHOSPHORIC ACID USING WASTE LIQUID FROM ETCHING PROCESS AND METHOD FOR REFINING THEREOF

PURPOSE: To provide a system for refining highly concentrated phosphoric acid from waste liquid from a manufacturing process of semiconductor or liquid crystalline display device and a method for refining thereof. CONSTITUTION: The system using waste liquid from etching process including 50-70 wt.%...

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Bibliographische Detailangaben
Hauptverfasser: KWON, KEUN SUB, KANG, KYUNG HEE, KIM, SUNG HWA
Format: Patent
Sprache:eng ; kor
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