SYSTEM FOR REFINING HIGHLY CONCENTRATED PHOSPHORIC ACID USING WASTE LIQUID FROM ETCHING PROCESS AND METHOD FOR REFINING THEREOF
PURPOSE: To provide a system for refining highly concentrated phosphoric acid from waste liquid from a manufacturing process of semiconductor or liquid crystalline display device and a method for refining thereof. CONSTITUTION: The system using waste liquid from etching process including 50-70 wt.%...
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creator | KWON, KEUN SUB KANG, KYUNG HEE KIM, SUNG HWA |
description | PURPOSE: To provide a system for refining highly concentrated phosphoric acid from waste liquid from a manufacturing process of semiconductor or liquid crystalline display device and a method for refining thereof. CONSTITUTION: The system using waste liquid from etching process including 50-70 wt.% of phosphoric acid, 10-30 wt.% of acetic acid, 5-10 wt.% of nitric acid and the remaining amount of water comprises a waste liquid storage part (101) which stores the waste liquid from etching process, a vacuum concentration reaction part (102) which condenses the waste liquid at the temperature of 90-118 deg.C under pressure of 300-700 mmHg to separate a lower layer of a highly concentrated phosphoric acid solution from an upper layer of a side product and a phosphoric acid solution storage part (105) which extracts the highly concentrated phosphoric acid solution from the vacuum concentration reaction part and then stores it. |
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CONSTITUTION: The system using waste liquid from etching process including 50-70 wt.% of phosphoric acid, 10-30 wt.% of acetic acid, 5-10 wt.% of nitric acid and the remaining amount of water comprises a waste liquid storage part (101) which stores the waste liquid from etching process, a vacuum concentration reaction part (102) which condenses the waste liquid at the temperature of 90-118 deg.C under pressure of 300-700 mmHg to separate a lower layer of a highly concentrated phosphoric acid solution from an upper layer of a side product and a phosphoric acid solution storage part (105) which extracts the highly concentrated phosphoric acid solution from the vacuum concentration reaction part and then stores it.</description><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>INORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNTbsKwjAU7eIg6j9ccBZaLKJjmtw0wTZpb1KkUykSJ9FC3f11W3BxczgcOM9l9Hat81iCtASEUhttclA6V0UL3BqOxhPzKKBS1k0gzYFxLaBxc_LCpjYUum4mSZItAT1Xs1OR5egcMCOgRK-s-P3wCgmtXEeLW38fw-bLq2gr54ldGJ5dGIf-Gh7h1Z0pieP0kBzTU5Yl-_9SHzx5PPo</recordid><startdate>20041206</startdate><enddate>20041206</enddate><creator>KWON, KEUN SUB</creator><creator>KANG, KYUNG HEE</creator><creator>KIM, SUNG HWA</creator><scope>EVB</scope></search><sort><creationdate>20041206</creationdate><title>SYSTEM FOR REFINING HIGHLY CONCENTRATED PHOSPHORIC ACID USING WASTE LIQUID FROM ETCHING PROCESS AND METHOD FOR REFINING THEREOF</title><author>KWON, KEUN SUB ; KANG, KYUNG HEE ; KIM, SUNG HWA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR100461849BB13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2004</creationdate><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>INORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>KWON, KEUN SUB</creatorcontrib><creatorcontrib>KANG, KYUNG HEE</creatorcontrib><creatorcontrib>KIM, SUNG HWA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KWON, KEUN SUB</au><au>KANG, KYUNG HEE</au><au>KIM, SUNG HWA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SYSTEM FOR REFINING HIGHLY CONCENTRATED PHOSPHORIC ACID USING WASTE LIQUID FROM ETCHING PROCESS AND METHOD FOR REFINING THEREOF</title><date>2004-12-06</date><risdate>2004</risdate><abstract>PURPOSE: To provide a system for refining highly concentrated phosphoric acid from waste liquid from a manufacturing process of semiconductor or liquid crystalline display device and a method for refining thereof. CONSTITUTION: The system using waste liquid from etching process including 50-70 wt.% of phosphoric acid, 10-30 wt.% of acetic acid, 5-10 wt.% of nitric acid and the remaining amount of water comprises a waste liquid storage part (101) which stores the waste liquid from etching process, a vacuum concentration reaction part (102) which condenses the waste liquid at the temperature of 90-118 deg.C under pressure of 300-700 mmHg to separate a lower layer of a highly concentrated phosphoric acid solution from an upper layer of a side product and a phosphoric acid solution storage part (105) which extracts the highly concentrated phosphoric acid solution from the vacuum concentration reaction part and then stores it.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS |
title | SYSTEM FOR REFINING HIGHLY CONCENTRATED PHOSPHORIC ACID USING WASTE LIQUID FROM ETCHING PROCESS AND METHOD FOR REFINING THEREOF |
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