AIR INTAKE DEVICE OF CVD EQUIPMENT AND METHOD FOR REMOVING CHEMICAL CONTAINMENT USING THE SAME

PURPOSE: An air intake device of CVD equipment and a method for removing a chemical containment using the same are provided to improve capacity of a semiconductor device by installing a chemical filter for removing chemical pollutants in an air intake device. CONSTITUTION: The first filter(100) is u...

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Bibliographische Detailangaben
Hauptverfasser:	CHO, JONG HYEONG, YANG, CHANG JIP, PARK, YEONG GYU, YUK, GEUN MOK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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