IN-SITU MONITORING OF THE CHANGE IN THICKNESS OF FILMS

The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are...

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Hauptverfasser:	HALPERIN, ARNOLD, LI, LEPING, HEINZ, TONY FREDERICK, BARBEE, STEVEN GEORGE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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creator	HALPERIN, ARNOLD LI, LEPING HEINZ, TONY FREDERICK BARBEE, STEVEN GEORGE
description	The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are induced in the film by a generating an alternating electromagnetic field with a sensor which includes a capacitor and an inductor.
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fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR100209042BB1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR100209042BB1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR100209042BB13</originalsourceid><addsrcrecordid>eNrjZDDz9NMN9gwJVfD19_MM8Q_y9HNX8HdTCPFwVXD2cPRzd1Xw9APyPJ29_VyDg0FSbp4-vsE8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSTeO8jQwMDIwNLAxMjJydCYOFUAkcEogw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>IN-SITU MONITORING OF THE CHANGE IN THICKNESS OF FILMS</title><source>esp@cenet</source><creator>HALPERIN, ARNOLD ; LI, LEPING ; HEINZ, TONY FREDERICK ; BARBEE, STEVEN GEORGE</creator><creatorcontrib>HALPERIN, ARNOLD ; LI, LEPING ; HEINZ, TONY FREDERICK ; BARBEE, STEVEN GEORGE</creatorcontrib><description>The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are induced in the film by a generating an alternating electromagnetic field with a sensor which includes a capacitor and an inductor.</description><edition>6</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990715&DB=EPODOC&CC=KR&NR=100209042B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990715&DB=EPODOC&CC=KR&NR=100209042B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HALPERIN, ARNOLD</creatorcontrib><creatorcontrib>LI, LEPING</creatorcontrib><creatorcontrib>HEINZ, TONY FREDERICK</creatorcontrib><creatorcontrib>BARBEE, STEVEN GEORGE</creatorcontrib><title>IN-SITU MONITORING OF THE CHANGE IN THICKNESS OF FILMS</title><description>The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are induced in the film by a generating an alternating electromagnetic field with a sensor which includes a capacitor and an inductor.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDz9NMN9gwJVfD19_MM8Q_y9HNX8HdTCPFwVXD2cPRzd1Xw9APyPJ29_VyDg0FSbp4-vsE8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSTeO8jQwMDIwNLAxMjJydCYOFUAkcEogw</recordid><startdate>19990715</startdate><enddate>19990715</enddate><creator>HALPERIN, ARNOLD</creator><creator>LI, LEPING</creator><creator>HEINZ, TONY FREDERICK</creator><creator>BARBEE, STEVEN GEORGE</creator><scope>EVB</scope></search><sort><creationdate>19990715</creationdate><title>IN-SITU MONITORING OF THE CHANGE IN THICKNESS OF FILMS</title><author>HALPERIN, ARNOLD ; LI, LEPING ; HEINZ, TONY FREDERICK ; BARBEE, STEVEN GEORGE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR100209042BB13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HALPERIN, ARNOLD</creatorcontrib><creatorcontrib>LI, LEPING</creatorcontrib><creatorcontrib>HEINZ, TONY FREDERICK</creatorcontrib><creatorcontrib>BARBEE, STEVEN GEORGE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HALPERIN, ARNOLD</au><au>LI, LEPING</au><au>HEINZ, TONY FREDERICK</au><au>BARBEE, STEVEN GEORGE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>IN-SITU MONITORING OF THE CHANGE IN THICKNESS OF FILMS</title><date>1999-07-15</date><risdate>1999</risdate><abstract>The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are induced in the film by a generating an alternating electromagnetic field with a sensor which includes a capacitor and an inductor.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
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recordid	cdi_epo_espacenet_KR100209042BB1
source	esp@cenet
subjects	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
title	IN-SITU MONITORING OF THE CHANGE IN THICKNESS OF FILMS
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T22%3A25%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HALPERIN,%20ARNOLD&rft.date=1999-07-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR100209042BB1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true