PHOTOSENSITIVE COMPOSITION
PURPOSE:To make possible to use water as a developing agent of the titled composition, and to form inexpensively a fine pattern by composing the titled composition of a resin which has a dialkyl aminomethyl group substd. in an aromatic ring contd. in the resin contg. an aromatic hydroxy compd. and i...
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| creator | HORIGUCHI RUMIKO HAYASE SHUJI ONISHI YASUNOBU |
| description | PURPOSE:To make possible to use water as a developing agent of the titled composition, and to form inexpensively a fine pattern by composing the titled composition of a resin which has a dialkyl aminomethyl group substd. in an aromatic ring contd. in the resin contg. an aromatic hydroxy compd. and its derivative as a constituting component, and a compd. capable of generating an acid by irradiating a light. CONSTITUTION:The titled composition contains the resin which has the dialkyl aminomethyl group substd. in the aromatic ring contd. in the resin contg. the aromatic hydroxy compd. and its derivative as the constituting component, and the compd. capable of generating the acid by irradiation of light. The usable resin is composed of the resin in which the dialkyl aminomethyl group is introduced to the aromatic ring contd. in the resin contg. the aromatic hydroxy compd. and its derivative as the constituting component by Mannich reaction using a formalin and a sec. amine. The resin contg. the aromatic hydroxy compd. and its derivative as the constituting component is exemplified by a novolak resin, a polyvinyl phenol or a polyisopropenyl phenol, etc. The titled composition makes possible to use the water as the developing agent, and give the fine pattern. |
| format | Patent |
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CONSTITUTION:The titled composition contains the resin which has the dialkyl aminomethyl group substd. in the aromatic ring contd. in the resin contg. the aromatic hydroxy compd. and its derivative as the constituting component, and the compd. capable of generating the acid by irradiation of light. The usable resin is composed of the resin in which the dialkyl aminomethyl group is introduced to the aromatic ring contd. in the resin contg. the aromatic hydroxy compd. and its derivative as the constituting component by Mannich reaction using a formalin and a sec. amine. The resin contg. the aromatic hydroxy compd. and its derivative as the constituting component is exemplified by a novolak resin, a polyvinyl phenol or a polyisopropenyl phenol, etc. The titled composition makes possible to use the water as the developing agent, and give the fine pattern.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; AUXILIARY PROCESSES IN PHOTOGRAPHY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS</subject><creationdate>1989</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890403&DB=EPODOC&CC=JP&NR=S6488541A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890403&DB=EPODOC&CC=JP&NR=S6488541A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HORIGUCHI RUMIKO</creatorcontrib><creatorcontrib>HAYASE SHUJI</creatorcontrib><creatorcontrib>ONISHI YASUNOBU</creatorcontrib><title>PHOTOSENSITIVE COMPOSITION</title><description>PURPOSE:To make possible to use water as a developing agent of the titled composition, and to form inexpensively a fine pattern by composing the titled composition of a resin which has a dialkyl aminomethyl group substd. in an aromatic ring contd. in the resin contg. an aromatic hydroxy compd. and its derivative as a constituting component, and a compd. capable of generating an acid by irradiating a light. CONSTITUTION:The titled composition contains the resin which has the dialkyl aminomethyl group substd. in the aromatic ring contd. in the resin contg. the aromatic hydroxy compd. and its derivative as the constituting component, and the compd. capable of generating the acid by irradiation of light. The usable resin is composed of the resin in which the dialkyl aminomethyl group is introduced to the aromatic ring contd. in the resin contg. the aromatic hydroxy compd. and its derivative as the constituting component by Mannich reaction using a formalin and a sec. amine. The resin contg. the aromatic hydroxy compd. and its derivative as the constituting component is exemplified by a novolak resin, a polyvinyl phenol or a polyisopropenyl phenol, etc. The titled composition makes possible to use the water as the developing agent, and give the fine pattern.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1989</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAK8PAP8Q929Qv2DPEMc1Vw9vcN8Aex_f14GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakm8V0CwmYmFhamJoaMxEUoAL_8gtw</recordid><startdate>19890403</startdate><enddate>19890403</enddate><creator>HORIGUCHI RUMIKO</creator><creator>HAYASE SHUJI</creator><creator>ONISHI YASUNOBU</creator><scope>EVB</scope></search><sort><creationdate>19890403</creationdate><title>PHOTOSENSITIVE COMPOSITION</title><author>HORIGUCHI RUMIKO ; HAYASE SHUJI ; ONISHI YASUNOBU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS6488541A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1989</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HORIGUCHI RUMIKO</creatorcontrib><creatorcontrib>HAYASE SHUJI</creatorcontrib><creatorcontrib>ONISHI YASUNOBU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HORIGUCHI RUMIKO</au><au>HAYASE SHUJI</au><au>ONISHI YASUNOBU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE COMPOSITION</title><date>1989-04-03</date><risdate>1989</risdate><abstract>PURPOSE:To make possible to use water as a developing agent of the titled composition, and to form inexpensively a fine pattern by composing the titled composition of a resin which has a dialkyl aminomethyl group substd. in an aromatic ring contd. in the resin contg. an aromatic hydroxy compd. and its derivative as a constituting component, and a compd. capable of generating an acid by irradiating a light. CONSTITUTION:The titled composition contains the resin which has the dialkyl aminomethyl group substd. in the aromatic ring contd. in the resin contg. the aromatic hydroxy compd. and its derivative as the constituting component, and the compd. capable of generating the acid by irradiation of light. The usable resin is composed of the resin in which the dialkyl aminomethyl group is introduced to the aromatic ring contd. in the resin contg. the aromatic hydroxy compd. and its derivative as the constituting component by Mannich reaction using a formalin and a sec. amine. The resin contg. the aromatic hydroxy compd. and its derivative as the constituting component is exemplified by a novolak resin, a polyvinyl phenol or a polyisopropenyl phenol, etc. The titled composition makes possible to use the water as the developing agent, and give the fine pattern.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
| recordid | cdi_epo_espacenet_JPS6488541A |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS |
| title | PHOTOSENSITIVE COMPOSITION |
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