EVAPORATING SOURCE DEVICE FOR ALUMINUM
PURPOSE:To prevent the creeping up of Al and to constitute a device suitable for evaporation of Al by forming a crucible into double construction and using vitrocarbon for the inside crucible to decrease the reactivity with Al. CONSTITUTION:A 1st graphite susceptor (outside crucible) 22 is provided...
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| creator | NAKABACHI YOSHIKI |
| description | PURPOSE:To prevent the creeping up of Al and to constitute a device suitable for evaporation of Al by forming a crucible into double construction and using vitrocarbon for the inside crucible to decrease the reactivity with Al. CONSTITUTION:A 1st graphite susceptor (outside crucible) 22 is provided in contact with an electrode 21 necessary for thermionic bombardment and the susceptor 22 is joined to a 2nd graphite susceptor (outside crucible) 24. The inside crucible 26 consisting of the graphite carbon or vitrocarbon isolated from the susceptor 22 via a bottoming up plate 25 consisting of graphite is provided in contact with the susceptor 24. An ejection hole cap 27 consisting of the graphite is disposed to the upper part of the inside crucible 26. The crucible of an Al evaporating source device is made into the double construction and a degree of freedom in shape is provided to the heating part so that a uniform heating characteristic is obtd., therefore, the creeping up of the Al is prevented. |
| format | Patent |
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CONSTITUTION:A 1st graphite susceptor (outside crucible) 22 is provided in contact with an electrode 21 necessary for thermionic bombardment and the susceptor 22 is joined to a 2nd graphite susceptor (outside crucible) 24. The inside crucible 26 consisting of the graphite carbon or vitrocarbon isolated from the susceptor 22 via a bottoming up plate 25 consisting of graphite is provided in contact with the susceptor 24. An ejection hole cap 27 consisting of the graphite is disposed to the upper part of the inside crucible 26. The crucible of an Al evaporating source device is made into the double construction and a degree of freedom in shape is provided to the heating part so that a uniform heating characteristic is obtd., therefore, the creeping up of the Al is prevented.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1988</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19880316&DB=EPODOC&CC=JP&NR=S6360271A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19880316&DB=EPODOC&CC=JP&NR=S6360271A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKABACHI YOSHIKI</creatorcontrib><title>EVAPORATING SOURCE DEVICE FOR ALUMINUM</title><description>PURPOSE:To prevent the creeping up of Al and to constitute a device suitable for evaporation of Al by forming a crucible into double construction and using vitrocarbon for the inside crucible to decrease the reactivity with Al. CONSTITUTION:A 1st graphite susceptor (outside crucible) 22 is provided in contact with an electrode 21 necessary for thermionic bombardment and the susceptor 22 is joined to a 2nd graphite susceptor (outside crucible) 24. The inside crucible 26 consisting of the graphite carbon or vitrocarbon isolated from the susceptor 22 via a bottoming up plate 25 consisting of graphite is provided in contact with the susceptor 24. An ejection hole cap 27 consisting of the graphite is disposed to the upper part of the inside crucible 26. The crucible of an Al evaporating source device is made into the double construction and a degree of freedom in shape is provided to the heating part so that a uniform heating characteristic is obtd., therefore, the creeping up of the Al is prevented.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1988</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFBzDXMM8A9yDPH0c1cI9g8NcnZVcHEN8wRSbv5BCo4-ob6efqG-PAysaYk5xam8UJqbQcHNNcTZQze1ID8-tbggMTk1L7Uk3isg2MzYzMDI3NDRmAglAJCoI4U</recordid><startdate>19880316</startdate><enddate>19880316</enddate><creator>NAKABACHI YOSHIKI</creator><scope>EVB</scope></search><sort><creationdate>19880316</creationdate><title>EVAPORATING SOURCE DEVICE FOR ALUMINUM</title><author>NAKABACHI YOSHIKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS6360271A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1988</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>NAKABACHI YOSHIKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NAKABACHI YOSHIKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EVAPORATING SOURCE DEVICE FOR ALUMINUM</title><date>1988-03-16</date><risdate>1988</risdate><abstract>PURPOSE:To prevent the creeping up of Al and to constitute a device suitable for evaporation of Al by forming a crucible into double construction and using vitrocarbon for the inside crucible to decrease the reactivity with Al. CONSTITUTION:A 1st graphite susceptor (outside crucible) 22 is provided in contact with an electrode 21 necessary for thermionic bombardment and the susceptor 22 is joined to a 2nd graphite susceptor (outside crucible) 24. The inside crucible 26 consisting of the graphite carbon or vitrocarbon isolated from the susceptor 22 via a bottoming up plate 25 consisting of graphite is provided in contact with the susceptor 24. An ejection hole cap 27 consisting of the graphite is disposed to the upper part of the inside crucible 26. The crucible of an Al evaporating source device is made into the double construction and a degree of freedom in shape is provided to the heating part so that a uniform heating characteristic is obtd., therefore, the creeping up of the Al is prevented.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | EVAPORATING SOURCE DEVICE FOR ALUMINUM |
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