DRY ETCHING DEVICE
PURPOSE:To keep inside of a vacuum vessel constantly clean by liberation- removing any reactive product by heating by a method wherein removable adhesion preventive plates with heating unit inscribing upon the vacuum vessel are provided. CONSTITUTION:A dry etching device is provided with a vacuum ve...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | PURPOSE:To keep inside of a vacuum vessel constantly clean by liberation- removing any reactive product by heating by a method wherein removable adhesion preventive plates with heating unit inscribing upon the vacuum vessel are provided. CONSTITUTION:A dry etching device is provided with a vacuum vessel 1, a pair of flat plate electrodes 2, 3 opposingly provided in the vacuum vessel 1, a high frequency power supply 6 electrically connected to either one of the electrodes 2, 3 and removable adhesion preventive plates with a heating unit. Any product produced by reaction of etching gas adhering to the adhesion preventive plates 4 to a specimen can be liberation-removed by heating to keep inside of the vacuum vessel 1 constantly clean. Furthermore, even if the reactive product adhered to the adhesion preventive plates 4 can not be liberation- removed by heating, the removable adhesion preventive plates 4 can be replaced with new one. |
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