APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

PURPOSE:To prevent the oxidation of the wafer surface by providing a hood in series with the exhaust portion of the semiconductor wafer load side of a vertical diffusion furnace, and providing a pipe or dual layer having a N2 nozzle, along the internal wall of the hood. CONSTITUTION:When a wafer is...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	ATSUMI KENJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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