PATTERN FORMING MATERIAL

PURPOSE:To obtain the titled material effective to the minute working of a substrate having stage difference and having the excellent durability against RIE of oxygen by incorporating an alkaline soluble phenol resin, a photocrosslinking agent and a specified alkaline soluble organopolysiloxane in t...

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Bibliographische Detailangaben
Hauptverfasser:	OIE MASAYUKI, KAMIYA SHIGEMITSU, KONISHI ICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain the titled material effective to the minute working of a substrate having stage difference and having the excellent durability against RIE of oxygen by incorporating an alkaline soluble phenol resin, a photocrosslinking agent and a specified alkaline soluble organopolysiloxane in the titled material. CONSTITUTION:The titled material comprises the alkaline soluble phenol resin, the photocrosslinking agent and the alkaline soluble organopolysiloxane having a fundamental skeleton shown by formula I wherein (n) is an integer of >=1. Thus, the negative type pattern forming material which is effective to the minute working of the substrate having stage difference, and has the durability to the RIE (a reactive ion etching) of oxygen, and is especially suitable for a two layer structure resist processing holding both roles of an upper layer and an intermediate layer of a three layer structure resist, is obtd.