ETCHING OF GALLIUM ARSENIDE BY OPTICAL PUMPING
PURPOSE:To mirror etching of a GaAs substrate, by disposing the GaAs substrate in a reactant gas comprising Cl2, and irradiating it with light having a peak in a wavelength range that pumps the Cl2 gas optically. CONSTITUTION:After the inside of an etching chamber 1 is evacuated, a stop valve 3 is o...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!