EVAPORATOR

PURPOSE:To form a uniform thin film of high quality even on a large-sized substrate by providing a plurality of crucibles and moving the substrate while irradiating the substrate of the whole width with a beam. CONSTITUTION:A distance between a sealed crucible 2 and a substrate is so set that the be...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: NAKABACHI YOSHIKI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator NAKABACHI YOSHIKI
description PURPOSE:To form a uniform thin film of high quality even on a large-sized substrate by providing a plurality of crucibles and moving the substrate while irradiating the substrate of the whole width with a beam. CONSTITUTION:A distance between a sealed crucible 2 and a substrate is so set that the beam angle of cluster ions is set in a range that a thin film formed on a substrate 10 becomes homogeneous, and the crucibles 2 are so disposed that ion beams of a plurality (4 in the drawing) of crucibles 2 form a film in a uniform thickness on the substrate face even in a direction perpendicular to the moving direction of the substrate 10. The crucibles 2 simultaneously generate depositing substances, and generates cluster ions to irradiate the ions on the substrate 10. Here, a substrate holder is conveyed slowly in a direction perpendicular to the arranging direction of the crucibles 2 at a constant speed. Thus, a deposited film is uniformly formed on the whole substrate 10, thereby increasing the area of the substrate 10.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS63175416A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS63175416A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS63175416A3</originalsourceid><addsrcrecordid>eNrjZOByDXMM8A9yDPEP4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BwWbGhuamJoZmjsbEqAEAbpkcTg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EVAPORATOR</title><source>esp@cenet</source><creator>NAKABACHI YOSHIKI</creator><creatorcontrib>NAKABACHI YOSHIKI</creatorcontrib><description>PURPOSE:To form a uniform thin film of high quality even on a large-sized substrate by providing a plurality of crucibles and moving the substrate while irradiating the substrate of the whole width with a beam. CONSTITUTION:A distance between a sealed crucible 2 and a substrate is so set that the beam angle of cluster ions is set in a range that a thin film formed on a substrate 10 becomes homogeneous, and the crucibles 2 are so disposed that ion beams of a plurality (4 in the drawing) of crucibles 2 form a film in a uniform thickness on the substrate face even in a direction perpendicular to the moving direction of the substrate 10. The crucibles 2 simultaneously generate depositing substances, and generates cluster ions to irradiate the ions on the substrate 10. Here, a substrate holder is conveyed slowly in a direction perpendicular to the arranging direction of the crucibles 2 at a constant speed. Thus, a deposited film is uniformly formed on the whole substrate 10, thereby increasing the area of the substrate 10.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>1988</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19880719&amp;DB=EPODOC&amp;CC=JP&amp;NR=S63175416A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19880719&amp;DB=EPODOC&amp;CC=JP&amp;NR=S63175416A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKABACHI YOSHIKI</creatorcontrib><title>EVAPORATOR</title><description>PURPOSE:To form a uniform thin film of high quality even on a large-sized substrate by providing a plurality of crucibles and moving the substrate while irradiating the substrate of the whole width with a beam. CONSTITUTION:A distance between a sealed crucible 2 and a substrate is so set that the beam angle of cluster ions is set in a range that a thin film formed on a substrate 10 becomes homogeneous, and the crucibles 2 are so disposed that ion beams of a plurality (4 in the drawing) of crucibles 2 form a film in a uniform thickness on the substrate face even in a direction perpendicular to the moving direction of the substrate 10. The crucibles 2 simultaneously generate depositing substances, and generates cluster ions to irradiate the ions on the substrate 10. Here, a substrate holder is conveyed slowly in a direction perpendicular to the arranging direction of the crucibles 2 at a constant speed. Thus, a deposited film is uniformly formed on the whole substrate 10, thereby increasing the area of the substrate 10.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1988</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOByDXMM8A9yDPEP4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BwWbGhuamJoZmjsbEqAEAbpkcTg</recordid><startdate>19880719</startdate><enddate>19880719</enddate><creator>NAKABACHI YOSHIKI</creator><scope>EVB</scope></search><sort><creationdate>19880719</creationdate><title>EVAPORATOR</title><author>NAKABACHI YOSHIKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS63175416A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1988</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>NAKABACHI YOSHIKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NAKABACHI YOSHIKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EVAPORATOR</title><date>1988-07-19</date><risdate>1988</risdate><abstract>PURPOSE:To form a uniform thin film of high quality even on a large-sized substrate by providing a plurality of crucibles and moving the substrate while irradiating the substrate of the whole width with a beam. CONSTITUTION:A distance between a sealed crucible 2 and a substrate is so set that the beam angle of cluster ions is set in a range that a thin film formed on a substrate 10 becomes homogeneous, and the crucibles 2 are so disposed that ion beams of a plurality (4 in the drawing) of crucibles 2 form a film in a uniform thickness on the substrate face even in a direction perpendicular to the moving direction of the substrate 10. The crucibles 2 simultaneously generate depositing substances, and generates cluster ions to irradiate the ions on the substrate 10. Here, a substrate holder is conveyed slowly in a direction perpendicular to the arranging direction of the crucibles 2 at a constant speed. Thus, a deposited film is uniformly formed on the whole substrate 10, thereby increasing the area of the substrate 10.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JPS63175416A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title EVAPORATOR
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T12%3A36%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NAKABACHI%20YOSHIKI&rft.date=1988-07-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS63175416A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true