APPARATUS FOR MANUFACTURING THIN FILM SEMICONDUCTOR

PURPOSE:To improve the quality of an amorphous semiconductor thin film by plus biasing the potential of a semiconductor thin film forming portion on an insulating substrate in case of manufacturing the thin film by a plasma CVD method and preventing positive ions coming from a plasma from colliding....

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NABETA OSAMU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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