SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

PURPOSE:To facilitate forming patterns such as wirings on the surface of predetermined layers without producing defects by a method wherein steps in the surface are so provided as to make the lengths of patterns which pass near the highest parts of the steps shorter or a structure in which there are...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: UEKI KAZUYOSHI, SHIMODA MAKI, BANSHO JUNICHIRO, OONISHI TSUGUHIRO, SENBON TAKASHI, TOMOSAWA AKIHIRO
Format: Patent
Sprache:eng
Schlagworte:
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