ECR PLASMA DEVICE
PURPOSE:To control the acceleration of ion beams while enabling a substrate with large diameter to be processed by a method wherein a space in a divergence magnetic field leading-in the ion beams from a plasma production chamber and expanding the diameter of ion beams is provided between the plasma...
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| creator | MATSUO SEITARO NUMAJIRI KENJI SASAKI MASAMI INO YOICHI |
| description | PURPOSE:To control the acceleration of ion beams while enabling a substrate with large diameter to be processed by a method wherein a space in a divergence magnetic field leading-in the ion beams from a plasma production chamber and expanding the diameter of ion beams is provided between the plasma production chamber and a grid. CONSTITUTION:A space 30 is provided on a divergence magnetic field. A microwave reflecting sheet 11 is made of a metallic net with fairly fine mesh and high aperture rate, the diameter of ion beams coming out of the metallic net is notably expanded in the space 30 of divergence magnetic field reaching a grid 32 at a floating potential; and the beams, after being accelerated by another grid 33 at earth potential, irradiate a substrate 8 on a substrate holder 7. In such a constitution, a conical metallic shielding sheet 34 connected to the room walls of a plasma production chamber 1 together with the grid 32 at floating potential prevent the ion beams 31 expanding the diameter thereof from being disturbed by an intensive electric field as well as the surface processing of substrate 8 from becoming uneven. |
| format | Patent |
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CONSTITUTION:A space 30 is provided on a divergence magnetic field. A microwave reflecting sheet 11 is made of a metallic net with fairly fine mesh and high aperture rate, the diameter of ion beams coming out of the metallic net is notably expanded in the space 30 of divergence magnetic field reaching a grid 32 at a floating potential; and the beams, after being accelerated by another grid 33 at earth potential, irradiate a substrate 8 on a substrate holder 7. 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CONSTITUTION:A space 30 is provided on a divergence magnetic field. A microwave reflecting sheet 11 is made of a metallic net with fairly fine mesh and high aperture rate, the diameter of ion beams coming out of the metallic net is notably expanded in the space 30 of divergence magnetic field reaching a grid 32 at a floating potential; and the beams, after being accelerated by another grid 33 at earth potential, irradiate a substrate 8 on a substrate holder 7. In such a constitution, a conical metallic shielding sheet 34 connected to the room walls of a plasma production chamber 1 together with the grid 32 at floating potential prevent the ion beams 31 expanding the diameter thereof from being disturbed by an intensive electric field as well as the surface processing of substrate 8 from becoming uneven.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SEMICONDUCTOR DEVICES |
| title | ECR PLASMA DEVICE |
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