EXPOSURE SYSTEM
PURPOSE:To improve resolution and productivity, by providing a light transmitting body, which is displaced in the direction intersecting a light path, and has a rough surface between a light source and an original plate. CONSTITUTION:A light transmitting body 6, which has a rough surface 6a, is line...
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| creator | MORIUCHI NOBORU |
| description | PURPOSE:To improve resolution and productivity, by providing a light transmitting body, which is displaced in the direction intersecting a light path, and has a rough surface between a light source and an original plate. CONSTITUTION:A light transmitting body 6, which has a rough surface 6a, is linearly displaced and reciprocated in the direction intersecting a light path of light 4 by a driving mechanism. The light transmitting body 6 is provided between a light source 3 and an original plate 5. Therefore, spatial interference of the light 4 of such as laser having relatively short wavelength e.g., is decreased. Occurrence of interference fringe due to excessively good spatial interference and the resultant unclear profile of a figure, which is transferred on a material 1 to be exposed from the original plate 5, is avoided. The figure on the original plate 5 is transferred to the material 1 to be exposed by the light 4. Thus the exposing time is shortened, and the resolution of the figure, which is transferred from the original plate to the material to be exposed, can be improved without impairing productivity. |
| format | Patent |
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CONSTITUTION:A light transmitting body 6, which has a rough surface 6a, is linearly displaced and reciprocated in the direction intersecting a light path of light 4 by a driving mechanism. The light transmitting body 6 is provided between a light source 3 and an original plate 5. Therefore, spatial interference of the light 4 of such as laser having relatively short wavelength e.g., is decreased. Occurrence of interference fringe due to excessively good spatial interference and the resultant unclear profile of a figure, which is transferred on a material 1 to be exposed from the original plate 5, is avoided. The figure on the original plate 5 is transferred to the material 1 to be exposed by the light 4. Thus the exposing time is shortened, and the resolution of the figure, which is transferred from the original plate to the material to be exposed, can be improved without impairing productivity.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1987</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19870825&DB=EPODOC&CC=JP&NR=S62193120A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19870825&DB=EPODOC&CC=JP&NR=S62193120A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MORIUCHI NOBORU</creatorcontrib><title>EXPOSURE SYSTEM</title><description>PURPOSE:To improve resolution and productivity, by providing a light transmitting body, which is displaced in the direction intersecting a light path, and has a rough surface between a light source and an original plate. CONSTITUTION:A light transmitting body 6, which has a rough surface 6a, is linearly displaced and reciprocated in the direction intersecting a light path of light 4 by a driving mechanism. The light transmitting body 6 is provided between a light source 3 and an original plate 5. Therefore, spatial interference of the light 4 of such as laser having relatively short wavelength e.g., is decreased. Occurrence of interference fringe due to excessively good spatial interference and the resultant unclear profile of a figure, which is transferred on a material 1 to be exposed from the original plate 5, is avoided. The figure on the original plate 5 is transferred to the material 1 to be exposed by the light 4. Thus the exposing time is shortened, and the resolution of the figure, which is transferred from the original plate to the material to be exposed, can be improved without impairing productivity.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1987</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOB3jQjwDw4NclUIjgwOcfXlYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxXgHBZkaGlsaGRgaOxsSoAQAGZh2-</recordid><startdate>19870825</startdate><enddate>19870825</enddate><creator>MORIUCHI NOBORU</creator><scope>EVB</scope></search><sort><creationdate>19870825</creationdate><title>EXPOSURE SYSTEM</title><author>MORIUCHI NOBORU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS62193120A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1987</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>MORIUCHI NOBORU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MORIUCHI NOBORU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EXPOSURE SYSTEM</title><date>1987-08-25</date><risdate>1987</risdate><abstract>PURPOSE:To improve resolution and productivity, by providing a light transmitting body, which is displaced in the direction intersecting a light path, and has a rough surface between a light source and an original plate. CONSTITUTION:A light transmitting body 6, which has a rough surface 6a, is linearly displaced and reciprocated in the direction intersecting a light path of light 4 by a driving mechanism. The light transmitting body 6 is provided between a light source 3 and an original plate 5. Therefore, spatial interference of the light 4 of such as laser having relatively short wavelength e.g., is decreased. Occurrence of interference fringe due to excessively good spatial interference and the resultant unclear profile of a figure, which is transferred on a material 1 to be exposed from the original plate 5, is avoided. The figure on the original plate 5 is transferred to the material 1 to be exposed by the light 4. Thus the exposing time is shortened, and the resolution of the figure, which is transferred from the original plate to the material to be exposed, can be improved without impairing productivity.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | EXPOSURE SYSTEM |
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