SPUTTERING DEVICE FOR FORMATION OF MAGNETIC THIN FILM

PURPOSE:To enable the uniform magnetic characteristics of a magnetic film by forming the magnetic film of which the film ratio of inclined planes and flat parts is 0.75 or more on a substrate having a plurality of high step parts and flat parts by determining the angle made by the substrate surface...

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Bibliographische Detailangaben
Hauptverfasser:	HARA SHINICHI, KOBAYASHI TETSUO, MITSUOKA KATSUYA, SATO MITSUO, KUMAGAI AKIRA, NARUSHIGE SHINJI, SATO TADASHI, SETOYAMA HIDETSUGU, IMAGAWA TAKAO, KOZONO YUZO, HANAZONO MASANOBU, ARIMATSU KEIJI, SANO MASAAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INDUCTANCES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAGNETS METALLURGY SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSFORMERS
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