SLIGHTLY LUSTROUS ALUMINUM AND ALUMINUM ALLOY PLATES

PURPOSE:To obtain a slightly lustrous Al plate by etching a bright or dull finished Al plate so as to specify the surface roughness. CONSTITUTION:A bright or dull finished Al or Al alloy plate is treated with an about 7% aqueous NaOH soln. at about 60 deg.C for about 5sec. The maximum surface roughn...

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Hauptverfasser:	INOUE TAKESHI, SASAKI YASUNORI, KADOYAMA HISASHI, OMURA KENZO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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creator	INOUE TAKESHI SASAKI YASUNORI KADOYAMA HISASHI OMURA KENZO
description	PURPOSE:To obtain a slightly lustrous Al plate by etching a bright or dull finished Al plate so as to specify the surface roughness. CONSTITUTION:A bright or dull finished Al or Al alloy plate is treated with an about 7% aqueous NaOH soln. at about 60 deg.C for about 5sec. The maximum surface roughness of the plate in every direction is regulated to >=2mum, preferably 2-16mum, and the number of projections of >=0.635mum height or recesses of >=0.635mum depth is regulated to >=30, preferably 30-400 in 25.4mm range. The treated Al or Al alloy plate is subjected to an alumite forming treatment to obtain the slightly lustrous Al or Al alloy plate which is easily matched in luster.
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CONSTITUTION:A bright or dull finished Al or Al alloy plate is treated with an about 7% aqueous NaOH soln. at about 60 deg.C for about 5sec. The maximum surface roughness of the plate in every direction is regulated to >=2mum, preferably 2-16mum, and the number of projections of >=0.635mum height or recesses of >=0.635mum depth is regulated to >=30, preferably 30-400 in 25.4mm range. 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CONSTITUTION:A bright or dull finished Al or Al alloy plate is treated with an about 7% aqueous NaOH soln. at about 60 deg.C for about 5sec. The maximum surface roughness of the plate in every direction is regulated to >=2mum, preferably 2-16mum, and the number of projections of >=0.635mum height or recesses of >=0.635mum depth is regulated to >=30, preferably 30-400 in 25.4mm range. The treated Al or Al alloy plate is subjected to an alumite forming treatment to obtain the slightly lustrous Al or Al alloy plate which is easily matched in luster.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1986</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAJ9vF09wjxiVTwCQ0OCfIPDVZw9An19fQL9VVw9HNB4vj4-EcqBPg4hrgG8zCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeK-AYDNDS0NjS1NHYyKUAAC5GifD</recordid><startdate>19860509</startdate><enddate>19860509</enddate><creator>INOUE TAKESHI</creator><creator>SASAKI YASUNORI</creator><creator>KADOYAMA HISASHI</creator><creator>OMURA KENZO</creator><scope>EVB</scope></search><sort><creationdate>19860509</creationdate><title>SLIGHTLY LUSTROUS ALUMINUM AND ALUMINUM ALLOY PLATES</title><author>INOUE TAKESHI ; SASAKI YASUNORI ; KADOYAMA HISASHI ; OMURA KENZO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS6191395A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1986</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>INOUE TAKESHI</creatorcontrib><creatorcontrib>SASAKI YASUNORI</creatorcontrib><creatorcontrib>KADOYAMA HISASHI</creatorcontrib><creatorcontrib>OMURA KENZO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>INOUE TAKESHI</au><au>SASAKI YASUNORI</au><au>KADOYAMA HISASHI</au><au>OMURA KENZO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SLIGHTLY LUSTROUS ALUMINUM AND ALUMINUM ALLOY PLATES</title><date>1986-05-09</date><risdate>1986</risdate><abstract>PURPOSE:To obtain a slightly lustrous Al plate by etching a bright or dull finished Al plate so as to specify the surface roughness. CONSTITUTION:A bright or dull finished Al or Al alloy plate is treated with an about 7% aqueous NaOH soln. at about 60 deg.C for about 5sec. The maximum surface roughness of the plate in every direction is regulated to >=2mum, preferably 2-16mum, and the number of projections of >=0.635mum height or recesses of >=0.635mum depth is regulated to >=30, preferably 30-400 in 25.4mm range. The treated Al or Al alloy plate is subjected to an alumite forming treatment to obtain the slightly lustrous Al or Al alloy plate which is easily matched in luster.</abstract><oa>free_for_read</oa></addata></record>
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subjects	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
title	SLIGHTLY LUSTROUS ALUMINUM AND ALUMINUM ALLOY PLATES
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