SLIT EXPOSING DEVICE

PURPOSE:To adjust the quantity of exposure light and facilitate optical-axis adjusting operation by fitting two slit plates to two slide plates at both ends so that the gap of the slit part composed of the two slit plates is adjustable, and adjusting fitting positions of those slide plates to the sl...

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1. Verfasser: INOUE TOSHIYASU
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description PURPOSE:To adjust the quantity of exposure light and facilitate optical-axis adjusting operation by fitting two slit plates to two slide plates at both ends so that the gap of the slit part composed of the two slit plates is adjustable, and adjusting fitting positions of those slide plates to the slit plates. CONSTITUTION:The slit gap formed of the two slit plates 5-a and 5-b allows the quantity of exposure light to be adjusted by utilizing long hole parts 5-a' and 5- b' provided at both ends of the slit plates 5-a and 5-b. The two slit plates 5-a and 5-b are clamped and fixed to slide plates 9 with screws 10. Further, the slide pltes 9 are shifted in fitting position to the slit fitting plates 7 by utilizing cut parts 9-a provided to them, and clamped fixedly to the slit fitting plates 7 with screws 11. This device allows an adjustment of the quantity of exposure light and an adjustment of the optical axis to be made independently, so the optical- axis adjustment, for example, is made after the exposure quantity is adjusted.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS6148827A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS6148827A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS6148827A3</originalsourceid><addsrcrecordid>eNrjZBAJ9vEMUXCNCPAP9vRzV3BxDfN0duVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAcFmhiYWFkbmjsZEKAEASQIekg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SLIT EXPOSING DEVICE</title><source>esp@cenet</source><creator>INOUE TOSHIYASU</creator><creatorcontrib>INOUE TOSHIYASU</creatorcontrib><description>PURPOSE:To adjust the quantity of exposure light and facilitate optical-axis adjusting operation by fitting two slit plates to two slide plates at both ends so that the gap of the slit part composed of the two slit plates is adjustable, and adjusting fitting positions of those slide plates to the slit plates. CONSTITUTION:The slit gap formed of the two slit plates 5-a and 5-b allows the quantity of exposure light to be adjusted by utilizing long hole parts 5-a' and 5- b' provided at both ends of the slit plates 5-a and 5-b. The two slit plates 5-a and 5-b are clamped and fixed to slide plates 9 with screws 10. Further, the slide pltes 9 are shifted in fitting position to the slit fitting plates 7 by utilizing cut parts 9-a provided to them, and clamped fixedly to the slit fitting plates 7 with screws 11. This device allows an adjustment of the quantity of exposure light and an adjustment of the optical axis to be made independently, so the optical- axis adjustment, for example, is made after the exposure quantity is adjusted.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; CINEMATOGRAPHY ; ELECTROGRAPHY ; ELECTROPHOTOGRAPHY ; HOLOGRAPHY ; MAGNETOGRAPHY ; PHOTOGRAPHY ; PHYSICS</subject><creationdate>1986</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19860310&amp;DB=EPODOC&amp;CC=JP&amp;NR=S6148827A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19860310&amp;DB=EPODOC&amp;CC=JP&amp;NR=S6148827A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>INOUE TOSHIYASU</creatorcontrib><title>SLIT EXPOSING DEVICE</title><description>PURPOSE:To adjust the quantity of exposure light and facilitate optical-axis adjusting operation by fitting two slit plates to two slide plates at both ends so that the gap of the slit part composed of the two slit plates is adjustable, and adjusting fitting positions of those slide plates to the slit plates. CONSTITUTION:The slit gap formed of the two slit plates 5-a and 5-b allows the quantity of exposure light to be adjusted by utilizing long hole parts 5-a' and 5- b' provided at both ends of the slit plates 5-a and 5-b. The two slit plates 5-a and 5-b are clamped and fixed to slide plates 9 with screws 10. Further, the slide pltes 9 are shifted in fitting position to the slit fitting plates 7 by utilizing cut parts 9-a provided to them, and clamped fixedly to the slit fitting plates 7 with screws 11. This device allows an adjustment of the quantity of exposure light and an adjustment of the optical axis to be made independently, so the optical- axis adjustment, for example, is made after the exposure quantity is adjusted.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>ELECTROPHOTOGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MAGNETOGRAPHY</subject><subject>PHOTOGRAPHY</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1986</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAJ9vEMUXCNCPAP9vRzV3BxDfN0duVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAcFmhiYWFkbmjsZEKAEASQIekg</recordid><startdate>19860310</startdate><enddate>19860310</enddate><creator>INOUE TOSHIYASU</creator><scope>EVB</scope></search><sort><creationdate>19860310</creationdate><title>SLIT EXPOSING DEVICE</title><author>INOUE TOSHIYASU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS6148827A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1986</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>ELECTROPHOTOGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MAGNETOGRAPHY</topic><topic>PHOTOGRAPHY</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>INOUE TOSHIYASU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>INOUE TOSHIYASU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SLIT EXPOSING DEVICE</title><date>1986-03-10</date><risdate>1986</risdate><abstract>PURPOSE:To adjust the quantity of exposure light and facilitate optical-axis adjusting operation by fitting two slit plates to two slide plates at both ends so that the gap of the slit part composed of the two slit plates is adjustable, and adjusting fitting positions of those slide plates to the slit plates. CONSTITUTION:The slit gap formed of the two slit plates 5-a and 5-b allows the quantity of exposure light to be adjusted by utilizing long hole parts 5-a' and 5- b' provided at both ends of the slit plates 5-a and 5-b. The two slit plates 5-a and 5-b are clamped and fixed to slide plates 9 with screws 10. Further, the slide pltes 9 are shifted in fitting position to the slit fitting plates 7 by utilizing cut parts 9-a provided to them, and clamped fixedly to the slit fitting plates 7 with screws 11. This device allows an adjustment of the quantity of exposure light and an adjustment of the optical axis to be made independently, so the optical- axis adjustment, for example, is made after the exposure quantity is adjusted.</abstract><oa>free_for_read</oa></addata></record>
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subjects ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
ELECTROPHOTOGRAPHY
HOLOGRAPHY
MAGNETOGRAPHY
PHOTOGRAPHY
PHYSICS
title SLIT EXPOSING DEVICE
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-18T19%3A44%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=INOUE%20TOSHIYASU&rft.date=1986-03-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS6148827A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true