LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM

PURPOSE:To make fine adjustment for a leak gas flow rate ever so easy as well as to complete a leak in a short time without making minute duct inside a vacuum chamber flying up, by installing a buffer tank in position between the vacuum chamber and a leak gas source and also installing a leak valve...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: OKA SATOHIKO, SAITOU NAOTAKE
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!