LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM
PURPOSE:To make fine adjustment for a leak gas flow rate ever so easy as well as to complete a leak in a short time without making minute duct inside a vacuum chamber flying up, by installing a buffer tank in position between the vacuum chamber and a leak gas source and also installing a leak valve...
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creator | OKA SATOHIKO SAITOU NAOTAKE |
description | PURPOSE:To make fine adjustment for a leak gas flow rate ever so easy as well as to complete a leak in a short time without making minute duct inside a vacuum chamber flying up, by installing a buffer tank in position between the vacuum chamber and a leak gas source and also installing a leak valve in front and the rear of the tank. CONSTITUTION:At the time of leading gas out of a leak gas source 4 into a vacuum chamber 1 made into the vacuous air by a vacuum pump 2, first of all, while a valve 8 and a leak valve 9 both are closed, a leak valve 10 is opened and gas is once lead into a buffer tank 3. Next, when a fact that a pressure differential between the buffer tank 3 and the vacuum chamber 1 comes to the setting value is detected by vacuum gauges 6 and 7, the leak valve 10 is closed by a control circuit 11 and on the other hand, the leak valve 9 is opened whereby the gas is led into the vacuum chamber 1 via a filter 5. In succession, at that point that the said pressure differential becomes less than the setting value, it is regarded as completion of leading-in the gas into the vacuum chamber 1 from the buffer tank 3, and so the leak valve 9 is closed while the leak valve 10 is opened instead. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS60256575A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS60256575A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS60256575A3</originalsourceid><addsrcrecordid>eNrjZDDxcXV00fX0U3BxDfN0dlVw8w9SAAp5K7g7BisAhcMcnUNDfRVcIzwcQ4NDFIIjg0NcfXkYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbxXQLCZgZGpmam5qaMxMWoAllUnUw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM</title><source>esp@cenet</source><creator>OKA SATOHIKO ; SAITOU NAOTAKE</creator><creatorcontrib>OKA SATOHIKO ; SAITOU NAOTAKE</creatorcontrib><description>PURPOSE:To make fine adjustment for a leak gas flow rate ever so easy as well as to complete a leak in a short time without making minute duct inside a vacuum chamber flying up, by installing a buffer tank in position between the vacuum chamber and a leak gas source and also installing a leak valve in front and the rear of the tank. CONSTITUTION:At the time of leading gas out of a leak gas source 4 into a vacuum chamber 1 made into the vacuous air by a vacuum pump 2, first of all, while a valve 8 and a leak valve 9 both are closed, a leak valve 10 is opened and gas is once lead into a buffer tank 3. Next, when a fact that a pressure differential between the buffer tank 3 and the vacuum chamber 1 comes to the setting value is detected by vacuum gauges 6 and 7, the leak valve 10 is closed by a control circuit 11 and on the other hand, the leak valve 9 is opened whereby the gas is led into the vacuum chamber 1 via a filter 5. In succession, at that point that the said pressure differential becomes less than the setting value, it is regarded as completion of leading-in the gas into the vacuum chamber 1 from the buffer tank 3, and so the leak valve 9 is closed while the leak valve 10 is opened instead.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BLASTING ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS ; PUMPS ; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS ; WEAPONS</subject><creationdate>1985</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19851218&DB=EPODOC&CC=JP&NR=S60256575A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19851218&DB=EPODOC&CC=JP&NR=S60256575A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OKA SATOHIKO</creatorcontrib><creatorcontrib>SAITOU NAOTAKE</creatorcontrib><title>LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM</title><description>PURPOSE:To make fine adjustment for a leak gas flow rate ever so easy as well as to complete a leak in a short time without making minute duct inside a vacuum chamber flying up, by installing a buffer tank in position between the vacuum chamber and a leak gas source and also installing a leak valve in front and the rear of the tank. CONSTITUTION:At the time of leading gas out of a leak gas source 4 into a vacuum chamber 1 made into the vacuous air by a vacuum pump 2, first of all, while a valve 8 and a leak valve 9 both are closed, a leak valve 10 is opened and gas is once lead into a buffer tank 3. Next, when a fact that a pressure differential between the buffer tank 3 and the vacuum chamber 1 comes to the setting value is detected by vacuum gauges 6 and 7, the leak valve 10 is closed by a control circuit 11 and on the other hand, the leak valve 9 is opened whereby the gas is led into the vacuum chamber 1 via a filter 5. In succession, at that point that the said pressure differential becomes less than the setting value, it is regarded as completion of leading-in the gas into the vacuum chamber 1 from the buffer tank 3, and so the leak valve 9 is closed while the leak valve 10 is opened instead.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS</subject><subject>PUMPS</subject><subject>PUMPS FOR LIQUIDS OR ELASTIC FLUIDS</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1985</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDxcXV00fX0U3BxDfN0dlVw8w9SAAp5K7g7BisAhcMcnUNDfRVcIzwcQ4NDFIIjg0NcfXkYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbxXQLCZgZGpmam5qaMxMWoAllUnUw</recordid><startdate>19851218</startdate><enddate>19851218</enddate><creator>OKA SATOHIKO</creator><creator>SAITOU NAOTAKE</creator><scope>EVB</scope></search><sort><creationdate>19851218</creationdate><title>LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM</title><author>OKA SATOHIKO ; SAITOU NAOTAKE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS60256575A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1985</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS</topic><topic>PUMPS</topic><topic>PUMPS FOR LIQUIDS OR ELASTIC FLUIDS</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>OKA SATOHIKO</creatorcontrib><creatorcontrib>SAITOU NAOTAKE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OKA SATOHIKO</au><au>SAITOU NAOTAKE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM</title><date>1985-12-18</date><risdate>1985</risdate><abstract>PURPOSE:To make fine adjustment for a leak gas flow rate ever so easy as well as to complete a leak in a short time without making minute duct inside a vacuum chamber flying up, by installing a buffer tank in position between the vacuum chamber and a leak gas source and also installing a leak valve in front and the rear of the tank. CONSTITUTION:At the time of leading gas out of a leak gas source 4 into a vacuum chamber 1 made into the vacuous air by a vacuum pump 2, first of all, while a valve 8 and a leak valve 9 both are closed, a leak valve 10 is opened and gas is once lead into a buffer tank 3. Next, when a fact that a pressure differential between the buffer tank 3 and the vacuum chamber 1 comes to the setting value is detected by vacuum gauges 6 and 7, the leak valve 10 is closed by a control circuit 11 and on the other hand, the leak valve 9 is opened whereby the gas is led into the vacuum chamber 1 via a filter 5. In succession, at that point that the said pressure differential becomes less than the setting value, it is regarded as completion of leading-in the gas into the vacuum chamber 1 from the buffer tank 3, and so the leak valve 9 is closed while the leak valve 10 is opened instead.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS WEAPONS |
title | LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM |
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