LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM

PURPOSE:To make fine adjustment for a leak gas flow rate ever so easy as well as to complete a leak in a short time without making minute duct inside a vacuum chamber flying up, by installing a buffer tank in position between the vacuum chamber and a leak gas source and also installing a leak valve...

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Hauptverfasser: OKA SATOHIKO, SAITOU NAOTAKE
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creator OKA SATOHIKO
SAITOU NAOTAKE
description PURPOSE:To make fine adjustment for a leak gas flow rate ever so easy as well as to complete a leak in a short time without making minute duct inside a vacuum chamber flying up, by installing a buffer tank in position between the vacuum chamber and a leak gas source and also installing a leak valve in front and the rear of the tank. CONSTITUTION:At the time of leading gas out of a leak gas source 4 into a vacuum chamber 1 made into the vacuous air by a vacuum pump 2, first of all, while a valve 8 and a leak valve 9 both are closed, a leak valve 10 is opened and gas is once lead into a buffer tank 3. Next, when a fact that a pressure differential between the buffer tank 3 and the vacuum chamber 1 comes to the setting value is detected by vacuum gauges 6 and 7, the leak valve 10 is closed by a control circuit 11 and on the other hand, the leak valve 9 is opened whereby the gas is led into the vacuum chamber 1 via a filter 5. In succession, at that point that the said pressure differential becomes less than the setting value, it is regarded as completion of leading-in the gas into the vacuum chamber 1 from the buffer tank 3, and so the leak valve 9 is closed while the leak valve 10 is opened instead.
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CONSTITUTION:At the time of leading gas out of a leak gas source 4 into a vacuum chamber 1 made into the vacuous air by a vacuum pump 2, first of all, while a valve 8 and a leak valve 9 both are closed, a leak valve 10 is opened and gas is once lead into a buffer tank 3. Next, when a fact that a pressure differential between the buffer tank 3 and the vacuum chamber 1 comes to the setting value is detected by vacuum gauges 6 and 7, the leak valve 10 is closed by a control circuit 11 and on the other hand, the leak valve 9 is opened whereby the gas is led into the vacuum chamber 1 via a filter 5. In succession, at that point that the said pressure differential becomes less than the setting value, it is regarded as completion of leading-in the gas into the vacuum chamber 1 from the buffer tank 3, and so the leak valve 9 is closed while the leak valve 10 is opened instead.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BLASTING ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS ; PUMPS ; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS ; WEAPONS</subject><creationdate>1985</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19851218&amp;DB=EPODOC&amp;CC=JP&amp;NR=S60256575A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19851218&amp;DB=EPODOC&amp;CC=JP&amp;NR=S60256575A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OKA SATOHIKO</creatorcontrib><creatorcontrib>SAITOU NAOTAKE</creatorcontrib><title>LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM</title><description>PURPOSE:To make fine adjustment for a leak gas flow rate ever so easy as well as to complete a leak in a short time without making minute duct inside a vacuum chamber flying up, by installing a buffer tank in position between the vacuum chamber and a leak gas source and also installing a leak valve in front and the rear of the tank. 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CONSTITUTION:At the time of leading gas out of a leak gas source 4 into a vacuum chamber 1 made into the vacuous air by a vacuum pump 2, first of all, while a valve 8 and a leak valve 9 both are closed, a leak valve 10 is opened and gas is once lead into a buffer tank 3. Next, when a fact that a pressure differential between the buffer tank 3 and the vacuum chamber 1 comes to the setting value is detected by vacuum gauges 6 and 7, the leak valve 10 is closed by a control circuit 11 and on the other hand, the leak valve 9 is opened whereby the gas is led into the vacuum chamber 1 via a filter 5. In succession, at that point that the said pressure differential becomes less than the setting value, it is regarded as completion of leading-in the gas into the vacuum chamber 1 from the buffer tank 3, and so the leak valve 9 is closed while the leak valve 10 is opened instead.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
BLASTING
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
HEATING
LIGHTING
MECHANICAL ENGINEERING
POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS
PUMPS
PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
WEAPONS
title LEAD-IN DEVICE FOR LEAK GAS IN VACUUM EXHAUST SYSTEM
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