MANUFACTURE OF SEMICONDUCTOR DEVICE

PURPOSE:To contrive to curtail the process index, and to enhance the number of lots to be processed at manufacture of semiconductor devices by a method wherein after a semiconductor substrate applied with a resist is prebaked, the above-mentioned resist is cooled rapidly to enhance sensitivity of th...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SAITOU KAZUYUKI, KATOU CHIHARU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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