PRODUCTION OF EPOXY RESIN
PURPOSE:To produce an epoxy resin having narrow molecular weight distribution, low melt viscosity, and high thermal stability and high reactivity with other resins, using only a small amount of catalyst, by reacting an epoxy compound with a polyhydric phenol in the presence of a catalyst comprising...
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| creator | TAKUWA NARITSUYO ARITOMI MICHIO |
| description | PURPOSE:To produce an epoxy resin having narrow molecular weight distribution, low melt viscosity, and high thermal stability and high reactivity with other resins, using only a small amount of catalyst, by reacting an epoxy compound with a polyhydric phenol in the presence of a catalyst comprising a specific phosphonium salt. CONSTITUTION:The objective resin can be produced by reacting (A) an epoxy compound with (B) a polyhydric phenol (preferably bisphenol A or tetrabromobisphenol A) in a proper organic solvent in an inert gas atmosphere at 80- 200 deg.C in the presence of (C) a catalyst comprising the phosphonium salt of formula (X is halogen, one of R1-R4 is residue of epoxy compound having epoxy group and/or hydroxyl group, and the others are phenyl or alkyl) obtained by the reaction of a phosphine with a halohydrin of an epoxy compound, e.g. (di) halohydrin of butyl glycidyl ether, bisphenol-A epoxy resin, etc. The amount of the catalyst is 0.01-0.03wt% of the reaction mixture excluding the solvent. |
| format | Patent |
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CONSTITUTION:The objective resin can be produced by reacting (A) an epoxy compound with (B) a polyhydric phenol (preferably bisphenol A or tetrabromobisphenol A) in a proper organic solvent in an inert gas atmosphere at 80- 200 deg.C in the presence of (C) a catalyst comprising the phosphonium salt of formula (X is halogen, one of R1-R4 is residue of epoxy compound having epoxy group and/or hydroxyl group, and the others are phenyl or alkyl) obtained by the reaction of a phosphine with a halohydrin of an epoxy compound, e.g. (di) halohydrin of butyl glycidyl ether, bisphenol-A epoxy resin, etc. The amount of the catalyst is 0.01-0.03wt% of the reaction mixture excluding the solvent.</description><language>eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; GENERAL PROCESSES OF COMPOUNDING ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>1985</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19850702&DB=EPODOC&CC=JP&NR=S60123527A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19850702&DB=EPODOC&CC=JP&NR=S60123527A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TAKUWA NARITSUYO</creatorcontrib><creatorcontrib>ARITOMI MICHIO</creatorcontrib><title>PRODUCTION OF EPOXY RESIN</title><description>PURPOSE:To produce an epoxy resin having narrow molecular weight distribution, low melt viscosity, and high thermal stability and high reactivity with other resins, using only a small amount of catalyst, by reacting an epoxy compound with a polyhydric phenol in the presence of a catalyst comprising a specific phosphonium salt. CONSTITUTION:The objective resin can be produced by reacting (A) an epoxy compound with (B) a polyhydric phenol (preferably bisphenol A or tetrabromobisphenol A) in a proper organic solvent in an inert gas atmosphere at 80- 200 deg.C in the presence of (C) a catalyst comprising the phosphonium salt of formula (X is halogen, one of R1-R4 is residue of epoxy compound having epoxy group and/or hydroxyl group, and the others are phenyl or alkyl) obtained by the reaction of a phosphine with a halohydrin of an epoxy compound, e.g. (di) halohydrin of butyl glycidyl ether, bisphenol-A epoxy resin, etc. The amount of the catalyst is 0.01-0.03wt% of the reaction mixture excluding the solvent.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1985</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAMCPJ3CXUO8fT3U_B3U3AN8I-IVAhyDfb042FgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BwWYGhkbGpkbmjsbEqAEAJqQgXg</recordid><startdate>19850702</startdate><enddate>19850702</enddate><creator>TAKUWA NARITSUYO</creator><creator>ARITOMI MICHIO</creator><scope>EVB</scope></search><sort><creationdate>19850702</creationdate><title>PRODUCTION OF EPOXY RESIN</title><author>TAKUWA NARITSUYO ; ARITOMI MICHIO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS60123527A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1985</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>TAKUWA NARITSUYO</creatorcontrib><creatorcontrib>ARITOMI MICHIO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TAKUWA NARITSUYO</au><au>ARITOMI MICHIO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PRODUCTION OF EPOXY RESIN</title><date>1985-07-02</date><risdate>1985</risdate><abstract>PURPOSE:To produce an epoxy resin having narrow molecular weight distribution, low melt viscosity, and high thermal stability and high reactivity with other resins, using only a small amount of catalyst, by reacting an epoxy compound with a polyhydric phenol in the presence of a catalyst comprising a specific phosphonium salt. CONSTITUTION:The objective resin can be produced by reacting (A) an epoxy compound with (B) a polyhydric phenol (preferably bisphenol A or tetrabromobisphenol A) in a proper organic solvent in an inert gas atmosphere at 80- 200 deg.C in the presence of (C) a catalyst comprising the phosphonium salt of formula (X is halogen, one of R1-R4 is residue of epoxy compound having epoxy group and/or hydroxyl group, and the others are phenyl or alkyl) obtained by the reaction of a phosphine with a halohydrin of an epoxy compound, e.g. (di) halohydrin of butyl glycidyl ether, bisphenol-A epoxy resin, etc. The amount of the catalyst is 0.01-0.03wt% of the reaction mixture excluding the solvent.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP |
| title | PRODUCTION OF EPOXY RESIN |
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