MANUFACTURE OF SEMICONDUCTOR ELEMENT

PURPOSE:To obtain the wafers having a constant threshold voltage by a method wherein, when the photosensitive resin film formed on the surface of a semiconductor wafer is to be removed, a plurality of wafers are brought into a reactor in such a manner that their surface will be headed in one directi...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SONOBE YUKIO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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