MANUFACTURE OF CEPHALOSPORIN DERIVATIVE
A process for the manufacture of a cephalosporin derivative of the formula I: in which X is sulphur, oxygen or sulphinyl; R is any one of the C-3 substituents from antibacterially-active cephalosporins known in the art; R is hydrogen or 1-6C alkyl; R is hydrogen or 1-6C alkyl; and the pharmaceutical...
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creator | FUREDERIKU HENRI YUNGU FURANKU ROFUTASU ANII ANTOWANETSUTO ORIBUIE |
description | A process for the manufacture of a cephalosporin derivative of the formula I: in which X is sulphur, oxygen or sulphinyl; R is any one of the C-3 substituents from antibacterially-active cephalosporins known in the art; R is hydrogen or 1-6C alkyl; R is hydrogen or 1-6C alkyl; and the pharmaceutically-acceptable acid-addition and base-addition salts thereof, characterised by cyclisation of a compound of the formula II: or a derivative thereof in which the carbonyl group is masked, or an acid-addition salt thereof, in which R and R individually have one of the values for R and R , R is a nitrogen-protecting group and R is hydrogen or any one of the cephalosporin 3-carboxylic acid protecting groups known in the art; whereafter when the product from the cyclisation reatains the protecting group R (when R is other than hydrogen) the protecting group R is replaced by hydrogen by conventional means; and whereafter when the compound of the formula I is obtained in the form of the free base or salt, and a pharmaceutically-acceptable salt or free base respectively is required, any necessary conversion between free base and salt is carried out by conventional means. |
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R is hydrogen or 1-6C alkyl; R is hydrogen or 1-6C alkyl; and the pharmaceutically-acceptable acid-addition and base-addition salts thereof, characterised by cyclisation of a compound of the formula II: or a derivative thereof in which the carbonyl group is masked, or an acid-addition salt thereof, in which R and R individually have one of the values for R and R , R is a nitrogen-protecting group and R is hydrogen or any one of the cephalosporin 3-carboxylic acid protecting groups known in the art; whereafter when the product from the cyclisation reatains the protecting group R (when R is other than hydrogen) the protecting group R is replaced by hydrogen by conventional means; and whereafter when the compound of the formula I is obtained in the form of the free base or salt, and a pharmaceutically-acceptable salt or free base respectively is required, any necessary conversion between free base and salt is carried out by conventional means.</description><language>eng</language><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; 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FURANKU ROFUTASU ; ANII ANTOWANETSUTO ORIBUIE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS59122492A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1984</creationdate><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>CHEMISTRY</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><toplevel>online_resources</toplevel><creatorcontrib>FUREDERIKU HENRI YUNGU</creatorcontrib><creatorcontrib>FURANKU ROFUTASU</creatorcontrib><creatorcontrib>ANII ANTOWANETSUTO ORIBUIE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FUREDERIKU HENRI YUNGU</au><au>FURANKU ROFUTASU</au><au>ANII ANTOWANETSUTO ORIBUIE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MANUFACTURE OF CEPHALOSPORIN DERIVATIVE</title><date>1984-07-14</date><risdate>1984</risdate><abstract>A process for the manufacture of a cephalosporin derivative of the formula I: in which X is sulphur, oxygen or sulphinyl; R is any one of the C-3 substituents from antibacterially-active cephalosporins known in the art; R is hydrogen or 1-6C alkyl; R is hydrogen or 1-6C alkyl; and the pharmaceutically-acceptable acid-addition and base-addition salts thereof, characterised by cyclisation of a compound of the formula II: or a derivative thereof in which the carbonyl group is masked, or an acid-addition salt thereof, in which R and R individually have one of the values for R and R , R is a nitrogen-protecting group and R is hydrogen or any one of the cephalosporin 3-carboxylic acid protecting groups known in the art; whereafter when the product from the cyclisation reatains the protecting group R (when R is other than hydrogen) the protecting group R is replaced by hydrogen by conventional means; and whereafter when the compound of the formula I is obtained in the form of the free base or salt, and a pharmaceutically-acceptable salt or free base respectively is required, any necessary conversion between free base and salt is carried out by conventional means.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMISTRY HETEROCYCLIC COMPOUNDS METALLURGY ORGANIC CHEMISTRY |
title | MANUFACTURE OF CEPHALOSPORIN DERIVATIVE |
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