OHMIC ELECTRODE FORMING METHOD IN COMPOUND SEMICONDUCTOR
PURPOSE:To provide ohmic electrode with small contact resistance and high reproductivity, by a method wherein on a compound semiconductor crystal with P as main constituent element is formed a high-melting metal layer at a low temperature, and Au layer is formed on the uppermost layer, and then the...
Gespeichert in:
Hauptverfasser: | , , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!