SEMICONDUCTOR LASER AND MANUFACTURE THEREOF

PURPOSE:To improve the yield of a semiconductor laser by manufacturing a BJB (Butt-Jointed Built-in) structure useful as an integrated laser by one crystal growth, thereby simplifying the manufacturing process. CONSTITUTION:After a photoresist used as a mask is removed, undoped InGaAsP active layers...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: UKOU KATSUYUKI, AKIBA SHIGEYUKI, SAKAI KAZUO, MATSUSHIMA HIROICHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator UKOU KATSUYUKI
AKIBA SHIGEYUKI
SAKAI KAZUO
MATSUSHIMA HIROICHI
description PURPOSE:To improve the yield of a semiconductor laser by manufacturing a BJB (Butt-Jointed Built-in) structure useful as an integrated laser by one crystal growth, thereby simplifying the manufacturing process. CONSTITUTION:After a photoresist used as a mask is removed, undoped InGaAsP active layers 2, 2' as the first semiconductor layer and P type InP or InGaAsP layers 7, 7' as the second semiconductor layer are grown by liquid phase epitaxial method on an N type InP substrate 1, and further an undoped InGaAsP photowave guide layers 5, 5' as the third semiconductor layer, and undoped INP or InGaAsP layers 8, 8' as the fourth semiconductor layers are sequentially grown continuously. In this case, since the width of mesa is wide, the respective layers are grown on the mesa, and formed separately on and under the mesa. The end of the layer 2' can be made coincident to that of the layer 5 by controlling the growing time of the layers 7, 7'.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS58216486A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS58216486A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS58216486A3</originalsourceid><addsrcrecordid>eNrjZNAOdvX1dPb3cwl1DvEPUvBxDHYNUnD0c1HwdfQLdXN0DgkNclUI8XANcvV342FgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BwaYWRoZmJhZmjsbEqAEAjVElaw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SEMICONDUCTOR LASER AND MANUFACTURE THEREOF</title><source>esp@cenet</source><creator>UKOU KATSUYUKI ; AKIBA SHIGEYUKI ; SAKAI KAZUO ; MATSUSHIMA HIROICHI</creator><creatorcontrib>UKOU KATSUYUKI ; AKIBA SHIGEYUKI ; SAKAI KAZUO ; MATSUSHIMA HIROICHI</creatorcontrib><description>PURPOSE:To improve the yield of a semiconductor laser by manufacturing a BJB (Butt-Jointed Built-in) structure useful as an integrated laser by one crystal growth, thereby simplifying the manufacturing process. CONSTITUTION:After a photoresist used as a mask is removed, undoped InGaAsP active layers 2, 2' as the first semiconductor layer and P type InP or InGaAsP layers 7, 7' as the second semiconductor layer are grown by liquid phase epitaxial method on an N type InP substrate 1, and further an undoped InGaAsP photowave guide layers 5, 5' as the third semiconductor layer, and undoped INP or InGaAsP layers 8, 8' as the fourth semiconductor layers are sequentially grown continuously. In this case, since the width of mesa is wide, the respective layers are grown on the mesa, and formed separately on and under the mesa. The end of the layer 2' can be made coincident to that of the layer 5 by controlling the growing time of the layers 7, 7'.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; DEVICES USING STIMULATED EMISSION ; ELECTRICITY</subject><creationdate>1983</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19831216&amp;DB=EPODOC&amp;CC=JP&amp;NR=S58216486A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19831216&amp;DB=EPODOC&amp;CC=JP&amp;NR=S58216486A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>UKOU KATSUYUKI</creatorcontrib><creatorcontrib>AKIBA SHIGEYUKI</creatorcontrib><creatorcontrib>SAKAI KAZUO</creatorcontrib><creatorcontrib>MATSUSHIMA HIROICHI</creatorcontrib><title>SEMICONDUCTOR LASER AND MANUFACTURE THEREOF</title><description>PURPOSE:To improve the yield of a semiconductor laser by manufacturing a BJB (Butt-Jointed Built-in) structure useful as an integrated laser by one crystal growth, thereby simplifying the manufacturing process. CONSTITUTION:After a photoresist used as a mask is removed, undoped InGaAsP active layers 2, 2' as the first semiconductor layer and P type InP or InGaAsP layers 7, 7' as the second semiconductor layer are grown by liquid phase epitaxial method on an N type InP substrate 1, and further an undoped InGaAsP photowave guide layers 5, 5' as the third semiconductor layer, and undoped INP or InGaAsP layers 8, 8' as the fourth semiconductor layers are sequentially grown continuously. In this case, since the width of mesa is wide, the respective layers are grown on the mesa, and formed separately on and under the mesa. The end of the layer 2' can be made coincident to that of the layer 5 by controlling the growing time of the layers 7, 7'.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1983</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAOdvX1dPb3cwl1DvEPUvBxDHYNUnD0c1HwdfQLdXN0DgkNclUI8XANcvV342FgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BwaYWRoZmJhZmjsbEqAEAjVElaw</recordid><startdate>19831216</startdate><enddate>19831216</enddate><creator>UKOU KATSUYUKI</creator><creator>AKIBA SHIGEYUKI</creator><creator>SAKAI KAZUO</creator><creator>MATSUSHIMA HIROICHI</creator><scope>EVB</scope></search><sort><creationdate>19831216</creationdate><title>SEMICONDUCTOR LASER AND MANUFACTURE THEREOF</title><author>UKOU KATSUYUKI ; AKIBA SHIGEYUKI ; SAKAI KAZUO ; MATSUSHIMA HIROICHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS58216486A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1983</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>UKOU KATSUYUKI</creatorcontrib><creatorcontrib>AKIBA SHIGEYUKI</creatorcontrib><creatorcontrib>SAKAI KAZUO</creatorcontrib><creatorcontrib>MATSUSHIMA HIROICHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>UKOU KATSUYUKI</au><au>AKIBA SHIGEYUKI</au><au>SAKAI KAZUO</au><au>MATSUSHIMA HIROICHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SEMICONDUCTOR LASER AND MANUFACTURE THEREOF</title><date>1983-12-16</date><risdate>1983</risdate><abstract>PURPOSE:To improve the yield of a semiconductor laser by manufacturing a BJB (Butt-Jointed Built-in) structure useful as an integrated laser by one crystal growth, thereby simplifying the manufacturing process. CONSTITUTION:After a photoresist used as a mask is removed, undoped InGaAsP active layers 2, 2' as the first semiconductor layer and P type InP or InGaAsP layers 7, 7' as the second semiconductor layer are grown by liquid phase epitaxial method on an N type InP substrate 1, and further an undoped InGaAsP photowave guide layers 5, 5' as the third semiconductor layer, and undoped INP or InGaAsP layers 8, 8' as the fourth semiconductor layers are sequentially grown continuously. In this case, since the width of mesa is wide, the respective layers are grown on the mesa, and formed separately on and under the mesa. The end of the layer 2' can be made coincident to that of the layer 5 by controlling the growing time of the layers 7, 7'.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JPS58216486A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRICITY
title SEMICONDUCTOR LASER AND MANUFACTURE THEREOF
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T18%3A40%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=UKOU%20KATSUYUKI&rft.date=1983-12-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS58216486A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true