FORMATION OF OPTICAL WAVEGUIDE
PURPOSE:To form a diffusion layer of an optical waveguide to a dielectric substrate, by irradiating the optical energy to the surface of the transparent dielectric substrate after forming a metallic thin film for optical waveguide in order to produce a reaction between the metallic thin film and the...
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| creator | UENISHI KATSUZOU |
| description | PURPOSE:To form a diffusion layer of an optical waveguide to a dielectric substrate, by irradiating the optical energy to the surface of the transparent dielectric substrate after forming a metallic thin film for optical waveguide in order to produce a reaction between the metallic thin film and the dielectric substrate. CONSTITUTION:A metallic thin film 12 is formed on the surface of a dielectric substrate 11 and at the part where an optical waveguide is formed. Then the light energy is irradiated from a light source 14 through the rear side of the substrate 11. The light energy is not virtually absorbed by the substrate and absorbed by the film 12. Then the heat is selectively generated to produce a reaction between the film 12 and the substrate 11. As a result, a metal (e.g., titanium) is diffused into the substrate 11. The absorbing coefficient of the optical energy of |
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CONSTITUTION:A metallic thin film 12 is formed on the surface of a dielectric substrate 11 and at the part where an optical waveguide is formed. Then the light energy is irradiated from a light source 14 through the rear side of the substrate 11. The light energy is not virtually absorbed by the substrate and absorbed by the film 12. Then the heat is selectively generated to produce a reaction between the film 12 and the substrate 11. As a result, a metal (e.g., titanium) is diffused into the substrate 11. The absorbing coefficient of the optical energy of <=600nm wavelengths increases at the metal diffused part. The diffusion is accelerated to form a diffusion layer 16. Therefore it is possible to form an optical waveguide in a short time without heating up the entire part of the substrate 11 but with the local heating which is carried out by making use of the selective absorption of the light energy.</description><language>eng</language><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS</subject><creationdate>1983</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19831108&DB=EPODOC&CC=JP&NR=S58190903A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19831108&DB=EPODOC&CC=JP&NR=S58190903A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>UENISHI KATSUZOU</creatorcontrib><title>FORMATION OF OPTICAL WAVEGUIDE</title><description>PURPOSE:To form a diffusion layer of an optical waveguide to a dielectric substrate, by irradiating the optical energy to the surface of the transparent dielectric substrate after forming a metallic thin film for optical waveguide in order to produce a reaction between the metallic thin film and the dielectric substrate. CONSTITUTION:A metallic thin film 12 is formed on the surface of a dielectric substrate 11 and at the part where an optical waveguide is formed. Then the light energy is irradiated from a light source 14 through the rear side of the substrate 11. The light energy is not virtually absorbed by the substrate and absorbed by the film 12. Then the heat is selectively generated to produce a reaction between the film 12 and the substrate 11. As a result, a metal (e.g., titanium) is diffused into the substrate 11. The absorbing coefficient of the optical energy of <=600nm wavelengths increases at the metal diffused part. The diffusion is accelerated to form a diffusion layer 16. Therefore it is possible to form an optical waveguide in a short time without heating up the entire part of the substrate 11 but with the local heating which is carried out by making use of the selective absorption of the light energy.</description><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1983</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJBz8w_ydQzx9PdT8HdT8A8I8XR29FEIdwxzdQ_1dHHlYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxXgHBphaGlgaWBsaOxsSoAQC-EiG0</recordid><startdate>19831108</startdate><enddate>19831108</enddate><creator>UENISHI KATSUZOU</creator><scope>EVB</scope></search><sort><creationdate>19831108</creationdate><title>FORMATION OF OPTICAL WAVEGUIDE</title><author>UENISHI KATSUZOU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS58190903A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1983</creationdate><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>UENISHI KATSUZOU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>UENISHI KATSUZOU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FORMATION OF OPTICAL WAVEGUIDE</title><date>1983-11-08</date><risdate>1983</risdate><abstract>PURPOSE:To form a diffusion layer of an optical waveguide to a dielectric substrate, by irradiating the optical energy to the surface of the transparent dielectric substrate after forming a metallic thin film for optical waveguide in order to produce a reaction between the metallic thin film and the dielectric substrate. CONSTITUTION:A metallic thin film 12 is formed on the surface of a dielectric substrate 11 and at the part where an optical waveguide is formed. Then the light energy is irradiated from a light source 14 through the rear side of the substrate 11. The light energy is not virtually absorbed by the substrate and absorbed by the film 12. Then the heat is selectively generated to produce a reaction between the film 12 and the substrate 11. As a result, a metal (e.g., titanium) is diffused into the substrate 11. The absorbing coefficient of the optical energy of <=600nm wavelengths increases at the metal diffused part. The diffusion is accelerated to form a diffusion layer 16. Therefore it is possible to form an optical waveguide in a short time without heating up the entire part of the substrate 11 but with the local heating which is carried out by making use of the selective absorption of the light energy.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS |
| title | FORMATION OF OPTICAL WAVEGUIDE |
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