ANODE PLATING DEVICE
PURPOSE:To obtain a device which is capable of easily replenishing an anode and obtaining uniform plating thickness, by installing a film form making an electrolyte pass through, onto the inside surface of an opening part on the plating surface side of an anode box, and filling the box with a granul...
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creator | NAKAKOUJI NAOMASA |
description | PURPOSE:To obtain a device which is capable of easily replenishing an anode and obtaining uniform plating thickness, by installing a film form making an electrolyte pass through, onto the inside surface of an opening part on the plating surface side of an anode box, and filling the box with a granular anode so that electric power can be supplied. CONSTITUTION:On the side of a strip D of a closed anode tank 2 for storing a granular anode 2, whose section is a square, an opening part 4 having a lattice 3 is provided, and to its inside, a film 5 of cloth, etc. for making an electrolyte pass through freely is fixed. To the outside and inside surfaces of the tank 2, lining of corrosion resistance, insulating property and conductivity is formed, and on both ends of the upper surface, lead-in pipes 6, 6' connected to a distributing branch pipe through insulators 7, 7' are provided. When a positive (+) current is made to flow to its one power supply terminal 9, an anode 1 in the tank 2 is dissolved electrochemically, becomes a metallic ion, passes through the film 5, and is electrodeposited to the plating surface of the strip D. The anode 1 becomes small and annihilates, but it is filled automatically at all times, and uniform plating is obtained. |
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CONSTITUTION:On the side of a strip D of a closed anode tank 2 for storing a granular anode 2, whose section is a square, an opening part 4 having a lattice 3 is provided, and to its inside, a film 5 of cloth, etc. for making an electrolyte pass through freely is fixed. To the outside and inside surfaces of the tank 2, lining of corrosion resistance, insulating property and conductivity is formed, and on both ends of the upper surface, lead-in pipes 6, 6' connected to a distributing branch pipe through insulators 7, 7' are provided. When a positive (+) current is made to flow to its one power supply terminal 9, an anode 1 in the tank 2 is dissolved electrochemically, becomes a metallic ion, passes through the film 5, and is electrodeposited to the plating surface of the strip D. The anode 1 becomes small and annihilates, but it is filled automatically at all times, and uniform plating is obtained.</description><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>1983</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19830106&DB=EPODOC&CC=JP&NR=S581099A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19830106&DB=EPODOC&CC=JP&NR=S581099A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKAKOUJI NAOMASA</creatorcontrib><title>ANODE PLATING DEVICE</title><description>PURPOSE:To obtain a device which is capable of easily replenishing an anode and obtaining uniform plating thickness, by installing a film form making an electrolyte pass through, onto the inside surface of an opening part on the plating surface side of an anode box, and filling the box with a granular anode so that electric power can be supplied. CONSTITUTION:On the side of a strip D of a closed anode tank 2 for storing a granular anode 2, whose section is a square, an opening part 4 having a lattice 3 is provided, and to its inside, a film 5 of cloth, etc. for making an electrolyte pass through freely is fixed. To the outside and inside surfaces of the tank 2, lining of corrosion resistance, insulating property and conductivity is formed, and on both ends of the upper surface, lead-in pipes 6, 6' connected to a distributing branch pipe through insulators 7, 7' are provided. When a positive (+) current is made to flow to its one power supply terminal 9, an anode 1 in the tank 2 is dissolved electrochemically, becomes a metallic ion, passes through the film 5, and is electrodeposited to the plating surface of the strip D. The anode 1 becomes small and annihilates, but it is filled automatically at all times, and uniform plating is obtained.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1983</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBBx9PN3cVUI8HEM8fRzV3BxDfN0duVhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfFeAcGmFoYGlpaOxoRVAAD7NB31</recordid><startdate>19830106</startdate><enddate>19830106</enddate><creator>NAKAKOUJI NAOMASA</creator><scope>EVB</scope></search><sort><creationdate>19830106</creationdate><title>ANODE PLATING DEVICE</title><author>NAKAKOUJI NAOMASA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS581099A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1983</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>NAKAKOUJI NAOMASA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NAKAKOUJI NAOMASA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ANODE PLATING DEVICE</title><date>1983-01-06</date><risdate>1983</risdate><abstract>PURPOSE:To obtain a device which is capable of easily replenishing an anode and obtaining uniform plating thickness, by installing a film form making an electrolyte pass through, onto the inside surface of an opening part on the plating surface side of an anode box, and filling the box with a granular anode so that electric power can be supplied. CONSTITUTION:On the side of a strip D of a closed anode tank 2 for storing a granular anode 2, whose section is a square, an opening part 4 having a lattice 3 is provided, and to its inside, a film 5 of cloth, etc. for making an electrolyte pass through freely is fixed. To the outside and inside surfaces of the tank 2, lining of corrosion resistance, insulating property and conductivity is formed, and on both ends of the upper surface, lead-in pipes 6, 6' connected to a distributing branch pipe through insulators 7, 7' are provided. When a positive (+) current is made to flow to its one power supply terminal 9, an anode 1 in the tank 2 is dissolved electrochemically, becomes a metallic ion, passes through the film 5, and is electrodeposited to the plating surface of the strip D. The anode 1 becomes small and annihilates, but it is filled automatically at all times, and uniform plating is obtained.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
title | ANODE PLATING DEVICE |
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